Improvements in or relating to radiation sensitive material
    4.
    发明公开
    Improvements in or relating to radiation sensitive material 失效
    辐射敏感材料的改进或相关

    公开(公告)号:EP0233072A3

    公开(公告)日:1988-06-01

    申请号:EP87301088

    申请日:1987-02-09

    申请人: VICKERS PLC

    IPC分类号: G03F07/08

    CPC分类号: G03F7/021

    摘要: Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula:
    in which, R represents H or CH₃; each R₁, which may be the same or different represents H or alkyl; R₂ represents a single bond or a substituted or unsubsti­tuted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.

    Aqueous developable photosensitive composition and printing plate
    10.
    发明公开
    Aqueous developable photosensitive composition and printing plate 失效
    水溶性可见光敏组合物和印刷板

    公开(公告)号:EP0040470A3

    公开(公告)日:1982-02-10

    申请号:EP81301599

    申请日:1981-04-10

    IPC分类号: G03F07/08

    摘要: A light-sensitive adduct comprising the combination of a diazo resin having a plurality of pendant diazonium groups and a sulfonated polymer having a plurality of sulfonate groups and a presensitized light-sensitive article comprising a substrate having a light-sensitive coating which is comprised of the light-sensitive adduct on a surface thereof. After imagewise exposure, unexposed portions of the coating are removable by water or aqueous developers.