摘要:
Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: in which, R represents H or CH₃; each R₁, which may be the same or different represents H or alkyl; R₂ represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.
摘要:
The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.
摘要:
A light-sensitive adduct comprising the combination of a diazo resin having a plurality of pendant diazonium groups and a sulfonated polymer having a plurality of sulfonate groups and a presensitized light-sensitive article comprising a substrate having a light-sensitive coating which is comprised of the light-sensitive adduct on a surface thereof. After imagewise exposure, unexposed portions of the coating are removable by water or aqueous developers.