公开(公告)号：EP3348665A4

公开(公告)日：2018-07-25

申请号：EP16843920

申请日：2016-09-01

申请人： JFE STEEL CORP

发明人： KASAI SHOJI ,  DOI TAKASHI ,  NISHIDE MASATOSHI

IPC分类号： C23C10/08 ,  C21D9/46 ,  C21D9/56 ,  C23C10/44 ,  C23C10/46

CPC分类号： C21D9/46 ,  C21D9/56 ,  C23C10/08 ,  C23C10/44 ,  C23C10/46

摘要： A high-silicon steel strip having an excellent surface quality is manufactured with high reaction efficiency. A basic configuration includes partition plates 2 arranged in the longitudinal direction of a furnace to extend from a position in the vicinity of respective gas nozzles 1 to be in parallel to the pass line of the steel strip, and obstacles 3 arranged to face partition-plate rear edges 20 in the longitudinal direction of the furnace to obstruct the flow of the gas along the steel strip so that siliconizing spaces s surrounded by the steel strip, the partition plates 2, and the obstacles 3 are formed; and gaps e a between the partition-plate rear edges 20 and the obstacles 3 and so forth which form exhaust passages e through which gas is discharged from the siliconizing spaces s to other spaces inside the furnace so that treatment gas which has been sprayed from the gas nozzles 1 onto a surface of the steel strip to flow through the siliconizing spaces s is discharged through the exhaust passages e. The relationship between the volume of the siliconizing spaces s and the area of the exhaust passages e is optimized in the basic configuration under a certain condition in accordance with the amount of the steel strip in the siliconizing spaces s.