公开(公告)号：EP1231205A4

公开(公告)日：2004-05-26

申请号：EP00974921

申请日：2000-11-10

Applicant: JSR CORP

Inventor： WANG YONG ,  MUTSUGA YASUAKI ,  SHIMIZU SHIGEO ,  SHIMOKAWA TSUTOMU ,  KUMANO ATSUSHI

IPC: C07C67/343 ,  C07C69/618 ,  C07D309/12 ,  C08F30/02 ,  G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0397 ,  C07C67/343 ,  C07C69/618 ,  C07D309/12 ,  C08F30/02 ,  G03F7/0045 ,  G03F7/039

Abstract: Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.