公开(公告)号：EP1398339A4

公开(公告)日：2006-11-29

申请号：EP02722907

申请日：2002-04-30

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU ,  YAMAMOTO MASAFUMI

IPC: C08G77/08 ,  C08G77/22 ,  C08G77/24 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  C08L83/08

CPC classification number: G03F7/0397 ,  C08G77/08 ,  C08G77/24 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0757

Abstract: A polysiloxane resin exhibiting high transparency even at a wavelength of 193nm (particularly 157nm) or below and excellent dry etching resistance, which comprises units represented by the general formula (I) and/or the general formula (II) and has acid−dissociable groups: (I) (II) (wherein R 1 is a fluorinated or fluoroalkylated monovalent aromatic group or a fluorinated or fluoroalkylated monovalent alicyclic group; and R 2 is a monovalent aromatic group described above, a monovalent alicyclic group described above, hydrogen, halogeno, a monovalent hydrocarbon group, haloalkyl, or amino). A radiation−sensitive resin composition excellent in sensitivity and resolution, which comprises (A) the above resin and (B) a radiation−sensitive acid generator.