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公开(公告)号：EP2666877B1
公开(公告)日：2019-05-15
申请号：EP12736158.2
申请日：2012-01-17
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公开(公告)号：EP2740810A1
公开(公告)日：2014-06-11
申请号：EP12855635.4
申请日：2012-11-13
发明人： TAKAHATA Masahiro
摘要： The present invention provides a method for producing high-purity calcium, the method being characterized by the following: performing first sublimation purification by introducing calcium starting material having a purity, excluding the gas components, of 4N or less into a crucible of a sublimation vessel, subjecting the starting material to sublimation by heating at 750°C to 800°C, and causing the product to deposit (evaporate) onto the inside walls of the sublimation vessel; and then, once the calcium that has been subjected to first sublimation purification is recovered, performing second sublimation purification by introducing the recovered calcium again to the crucible to the sublimation vessel, heating the recovered calcium at 750°C to 800°C, and causing the product to similarly deposit (evaporate) on the inside walls of the sublimation vessel thereby recovering calcium having a purity of 4N5 or higher It is an object of the present invention to provide a technology with which calcium that has been brought to a high-purity can be obtained with stability to be used for the production of high-purity lanthanum, as well as to be used as a reducing agent for other rare earth elements, a desulfurizing or deoxidizing agent for metals, or a getter for high-vacuum pumps.
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公开(公告)号：EP2740810B1
公开(公告)日：2018-10-10
申请号：EP12855635.4
申请日：2012-11-13
发明人： TAKAHATA Masahiro
摘要： The present invention provides a method for producing high-purity calcium, the method being characterized by the following: performing first sublimation purification by introducing calcium starting material having a purity, excluding the gas components, of 4N or less into a crucible of a sublimation vessel, subjecting the starting material to sublimation by heating at 750°C to 800°C, and causing the product to deposit (evaporate) onto the inside walls of the sublimation vessel; and then, once the calcium that has been subjected to first sublimation purification is recovered, performing second sublimation purification by introducing the recovered calcium again to the crucible to the sublimation vessel, heating the recovered calcium at 750°C to 800°C, and causing the product to similarly deposit (evaporate) on the inside walls of the sublimation vessel thereby recovering calcium having a purity of 4N5 or higher It is an object of the present invention to provide a technology with which calcium that has been brought to a high-purity can be obtained with stability to be used for the production of high-purity lanthanum, as well as to be used as a reducing agent for other rare earth elements, a desulfurizing or deoxidizing agent for metals, or a getter for high-vacuum pumps.
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4.发明公开METHOD FOR PRODUCING HIGH-PURITY LANTHANUM, HIGH-PURITY LANTHANUM, SPUTTERING TARGET FORMED FROM HIGH-PURITY LANTHANUM, AND METAL GATE FILM HAVING HIGH-PURITY LANTHANUM AS MAIN COMPONENT 审中-公开生产高纯度镧，高纯镧，由高纯度镧形成的溅射靶的方法以及以高纯度镧为主要成分的金属栅膜
公开(公告)号：EP2666877A1
公开(公告)日：2013-11-27
申请号：EP12736158.2
申请日：2012-01-17
CPC分类号： C25C3/34 , C22B9/22 , C22B59/00 , C22C28/00 , C23C14/3414 , H01L21/28079 , H01L29/517
摘要： The present invention addresses the problem of providing a technique capable of efficiently and stably providing a method for producing high-purity lanthanum, the method characterized in that: a crude lanthanum oxide starting material having a purity of 2N-5N, excluding gas components, is used; the material is subjected to molten salt electrolysis at a bath temperature of 450-700°C to produce lanthanum crystals; the lanthanum crystals are subsequently desalted: and electron beam melting is then performed to remove volatile substances. The present invention also addresses the problem of providing a technique capable of efficiently and stably providing high-purity lanthanum, high-purity lanthanum itself, a sputtering target formed from high-purity material lanthanum; and a thin film for metal gates that has high purity lanthanum as the main component.
摘要翻译： 本发明解决了提供能够有效且稳定地提供生产高纯度镧的方法的技术的问题，所述方法的特征在于：除气体成分外的纯度为2N-5N的粗氧化镧起始材料为 用过的; 该材料在450-700℃的浴温下进行熔盐电解以产生镧晶体; 随后将镧晶体脱盐：然后进行电子束熔化以除去挥发性物质。 本发明还解决了提供能够有效且稳定地提供高纯度镧，高纯度镧自身，由高纯度材料镧形成的溅射靶的技术的问题; 以及以高纯度镧为主要成分的金属门用薄膜。
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