利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

5 条记录 (耗时 0.009 秒)

    HIGH-PURITY TITANIUM INGOTS, MANUFACTURING METHOD THEREFOR, AND TITANIUM SPUTTERING TARGET
    2.
    发明公开
    HIGH-PURITY TITANIUM INGOTS, MANUFACTURING METHOD THEREFOR, AND TITANIUM SPUTTERING TARGET 有权
    HOCHREINETITANBLÖCKE，HERSTELLUNGSVERFAHRENDAFÜRUND TITAN-SPUTTERINGTARGET

    公开(公告)号：EP2772327A1

    公开(公告)日：2014-09-03

    申请号：EP13748626.2

    申请日：2013-02-13

    申请人： JX Nippon Mining & Metals Corporation

    发明人： YAGI, Kazuto ,  HINO, Eiji ,  SHINDO, Yuichiro

    IPC分类号： B22D21/06 ,  C22B9/22 ,  C22B34/12 ,  C22C1/02 ,  C22C14/00 ,  C23C14/34

    CPC分类号： C23C14/3414 ,  C22B9/22 ,  C22B9/228 ,  C22B34/1295 ,  C22C1/02 ,  C22C1/03 ,  C22C1/1084 ,  C22C14/00 ,  H01J37/3426

    摘要： Provided is a high-purity titanium ingot having a purity, excluding an additive element and gas components, of 99.99 mass% or more, wherein at least one nonmetallic element selected from S, P, and B is contained in a total amount of 0.1 to 100 mass ppm as the additive component and the variation in the content of the nonmetallic element between the top, middle, and bottom portions of the ingot is within ±200%. Provided is a method of manufacturing a titanium ingot containing a nonmetallic element in an amount of 0.1 to 100 mass ppm, wherein S, P, or B, which is a nonmetallic element, is added to molten titanium as an intermetallic compound or a master alloy to produce a high-purity titanium ingot having a purity, excluding an additive element and gas components, of 99.99 mass% or more. It is an object of the present invention to provide a high-purity titanium having decreased intra- and inter-ingot variations in the content of the nonmetallic element, a uniform structure, and improved strength by containing at least one nonmetallic element selected from S, P, and B.

    摘要翻译： 本发明提供一种纯度不高于99.99质量％以上的添加元素和气体成分的高纯钛锭，其中，选自S，P，B中的至少一种非金属元素的含量为0.1〜 100质量ppm作为添加成分，并且锭的顶部，中部和底部之间的非金属元素的含量变化在±200％以内。 提供一种制造含有0.1〜100质量ppm的非金属元素的钛锭的方法，其中作为非金属元素的S，P或B被添加到作为金属间化合物或母合金的熔融钛中 制造纯度不高于99.99质量％以上的添加元素和气体成分的高纯度钛锭。 本发明的一个目的是提供一种通过含有至少一种非金属元素选自S，S，C，C，C的组合，其中非金属元素含量的变化不均匀，结构均匀，强度提高， P和B.

    METHOD FOR MANUFACTURING HIGH-PURITY ERBIUM, HIGH-PURITY ERBIUM, SPUTTERING TARGET COMPOSED OF HIGH-PURITY ERBIUM, AND METAL GATE FILM HAVING HIGH-PURITY ERBIUM AS MAIN COMPONENT
    3.
    发明公开
    METHOD FOR MANUFACTURING HIGH-PURITY ERBIUM, HIGH-PURITY ERBIUM, SPUTTERING TARGET COMPOSED OF HIGH-PURITY ERBIUM, AND METAL GATE FILM HAVING HIGH-PURITY ERBIUM AS MAIN COMPONENT 有权
    工艺生产高纯度铒，高纯度铒，溅射靶从高纯度铒和金属栅膜具有高纯度铒为主要成分

    公开(公告)号：EP2383354A1

    公开(公告)日：2011-11-02

    申请号：EP10735697.4

    申请日：2010-01-13

    申请人： JX Nippon Mining & Metals Corporation

    发明人： SHINDO, Yuichiro ,  YAGI, Kazuto

    IPC分类号： C22B59/00 ,  C22B9/02 ,  C22B9/04 ,  C22B9/14 ,  C22C28/00 ,  C23C14/34

    CPC分类号： C22C28/00 ,  C22B5/04 ,  C22B5/16 ,  C22B9/006 ,  C22B9/14 ,  C22B59/00 ,  C23C14/3414

    摘要： Provided are a method for manufacturing high-purity erbium, wherein crude erbium oxide is mixed with reducing metal, erbium is reduced and distilled by heating the mixture in a vacuum, and the distillate is melted in an inert atmosphere to obtain high-purity erbium; and high-purity erbium, wherein the purity excluding rare-earth elements and gas components is 4N or higher and the oxygen content is 200 wtppm or less. An object of this invention is to provide a method of highly purifying erbium, which has a high vapor pressure and is difficult to be refined in a molten metal state, as well as technology for efficiently and stably providing high-purity erbium obtained with the foregoing method, a sputtering target composed of high-purity erbium, and a metal gate film having high-purity erbium as a main component.

    摘要翻译： 本发明提供一种用于制造高纯度铒，worin粗铒氧化物与还原性金属混合的方法，铒降低，并且通过在真空下加热混合物蒸馏，将馏出物在惰性气氛中熔化以得到高纯度的铒; 和高纯度铒，worin不含稀土元素和气体成分以外的纯度为4N以上，氧含量为200重量ppm以下。 本发明的一个目的是提供高度纯化铒，其具有高的蒸气压，并且难以在熔融金属状态待精炼，以及技术用于有效且稳定地提供具有前述中获得高纯度铒的方法 方法，高纯度铒组成的溅射靶，和金属栅极具有膜高纯度铒作为主成分。