公开(公告)号：EP1813694B1

公开(公告)日：2018-06-20

申请号：EP05800317.9

申请日：2005-11-04

申请人： JX Nippon Mining & Metals Corporation ,  TOHOKU UNIVERSITY

发明人： NAKAMURA, A., Isohara Fact. of Nikko Mat. Co., Ltd ,  YAHAGI, M., Isohara Fact. of Nikko Mat. Co., Ltd. ,  INOUE, Akihisa, 11-806, Kawauchijyuutaku ,  KIMURA, Hisamichi ,  YAMAURA, Shin-ichi

IPC分类号： C23C14/34 ,  B22F9/08 ,  C22C5/04 ,  C22C9/00 ,  C22C16/00 ,  C22C19/03 ,  C22C19/07 ,  C22C38/00 ,  B01D67/00 ,  B01D71/02 ,  C01B3/50 ,  C22C45/00 ,  C22C45/02 ,  C22C45/04 ,  C22C45/10

CPC分类号： C23C14/3414 ,  B01D67/0072 ,  B01D71/022 ,  B01D2325/04 ,  B22F2998/10 ,  B22F2999/00 ,  C01B3/503 ,  C01B3/505 ,  C22C5/04 ,  C22C9/00 ,  C22C16/00 ,  C22C19/03 ,  C22C19/07 ,  C22C45/001 ,  C22C45/003 ,  C22C45/02 ,  C22C45/04 ,  C22C45/10 ,  B22F9/082 ,  B22F3/10 ,  B22F2201/11

摘要： A sputtering target for producing a metallic glass membrane characterized in comprising a structure obtained by sintering atomized powder having a composition of a ternary compound system or greater with at least one or more metal elements selected from Pd, Zr, Fe, Co, Cu and Ni as its main component (component of greatest atomic %), and being an average grain size of 50µm or less. The prepared metallic glass membrane can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This sputtering target for producing the metallic glass membrane is also free from problems such as defects in the metallic glass membrane and unevenness of composition, has a uniform structure, can be produced efficiently and at low cost, and does not generate many nodules or particles. Further provided is a method for manufacturing such a sputtering target for forming the metallic glass membrane.

公开(公告)号：EP1813694A1

公开(公告)日：2007-08-01

申请号：EP05800317.9

申请日：2005-11-04

申请人： Nikko Materials Co., Ltd. ,  TOHOKU UNIVERSITY

发明人： NAKAMURA, A., Isohara Fact. of Nikko Mat. Co., Ltd ,  YAHAGI, M., Isohara Fact. of Nikko Mat. Co., Ltd. ,  INOUE, Akihisa, 11-806, Kawauchijyuutaku ,  KIMURA, Hisamichi ,  YAMAURA, Shin-ichi

IPC分类号： C23C14/34 ,  B22F9/08 ,  C22C5/04 ,  C22C9/00 ,  C22C16/00 ,  C22C19/03 ,  C22C19/07 ,  C22C38/00

CPC分类号： C23C14/3414 ,  B01D67/0072 ,  B01D71/022 ,  B01D2325/04 ,  B22F2998/10 ,  B22F2999/00 ,  C01B3/503 ,  C01B3/505 ,  C22C5/04 ,  C22C9/00 ,  C22C16/00 ,  C22C19/03 ,  C22C19/07 ,  C22C45/001 ,  C22C45/003 ,  C22C45/02 ,  C22C45/04 ,  C22C45/10 ,  B22F9/082 ,  B22F3/10 ,  B22F2201/11

摘要： A sputtering target for producing a metallic glass membrane characterized in comprising a structure obtained by sintering atomized powder having a composition of a ternary compound system or greater with at least one or more metal elements selected from Pd, Zr, Fe, Co, Cu and Ni as its main component (component of greatest atomic %), and being an average grain size of 50µm or less. The prepared metallic glass membrane can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This sputtering target for producing the metallic glass membrane is also free from problems such as defects in the metallic glass membrane and unevenness of composition, has a uniform structure, can be produced efficiently and at low cost, and does not generate many nodules or particles. Further provided is a method for manufacturing such a sputtering target for forming the metallic glass membrane.

摘要翻译： 用于在包括通过烧结具有三元复合系统的选自Pd，锆，铁，钴，铜和镍中选择的组合物或更大的与至少一种或多种金属元素的雾化粉末而获得的结构为特征的金属玻璃膜的溅射靶 作为其主要成分（的最大原子％的组分），并且是50微米或更小的平均晶粒尺寸。 将制备的金属玻璃膜可以用作用于通过熔融金属急冷法得到的常规高成本块状金属玻璃的替代品。 用于制造金属玻璃膜此溅射靶是这样从问题自由：如在金属玻璃膜和组成不均匀的缺陷，具有均匀的结构，能高效且低成本地制造，并且不产生许多结节或颗粒。 进一步提供的是用于制造寻求的溅射靶用于形成金属玻璃膜的方法。