摘要:
An apparatus is provided for evaluating electrical characteristics by bringing a plurality of metal probes in contact with a minute area with low contact resistance. Metal probes (8) are formed on the free end of a cantilever (6) on which are formed a resistor (5), two electrodes (1, 2) for resistance detection, and an electrode (7) for measuring electrical characteristics. The tips of the metal probes (8) can project beyond the free end of the cantilever (6) to reach an area of about 10 nm size. The probe position is controlled by an atomic force microscope technique to achieve low contact resistance.
摘要:
An apparatus is provided for evaluating electrical characteristics by bringing a plurality of metal probes in contact with a minute area with low contact resistance. A metal probe (8) is formed on the free end of a cantilever (6) on which are formed a resistor (5), two electrodes (1, 2) for resistance detection, and an electrode (7) for measuring electrical characteristics. The tip of the metal probe (8) projects beyond the free end of the cantilever (6). This configuration enables a plurality of probes to come into contact with an area of about 10 nm size. The probe position is controlled by an atomic force microscopy to achieve low contact resistance.