公开(公告)号：EP1747434A4

公开(公告)日：2008-05-14

申请号：EP05751944

申请日：2005-05-13

Applicant: KLA TENCOR TECH CORP

Inventor： FIELDEN JOHN ,  JANIK GARY ,  LEE SHING ,  ZHAO QIANG ,  KAACK TORSTEN ,  YOO SUNGCHUL ,  TAN ZHENGQUAN

IPC: G01N21/95 ,  G01J3/10 ,  G01J3/36 ,  G01J4/00 ,  G01N21/00 ,  G01N21/21 ,  G01N21/33 ,  G01N21/41 ,  G01N21/55

CPC classification number: G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2021/335

Abstract: Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.