公开(公告)号：EP3139400A1

公开(公告)日：2017-03-08

申请号：EP16185874.1

申请日：2016-08-26

Applicant: Kabushiki Kaisha Toshiba

Inventor： Yorisaki, Toma

IPC: H01J49/00 ,  H01J49/14 ,  H01J49/16

CPC classification number: H01J49/0004 ,  H01J49/0009 ,  H01J49/142 ,  H01J49/161

Abstract: According to an embodiment, a position correction sample (20) is used to correct an irradiation position of an ion beam with respect to a sample platform where an analysis object is disposed in mass spectrometry. The position correction sample (20) comprises a stacked body (LB1). The stacked body includes a first layer (201), a second layer (202), and a third layer (203). The first layer includes a first material. The second layer is provided on the first layer. The second layer includes a second material. The third layer is provided on the second layer. The third layer includes a third material.

Abstract translation: 根据实施例，使用位置校正样本（20）来校正离子束相对于质谱分析对象物的样品平台的照射位置。 位置校正样本（20）包括层叠体（LB1）。 层叠体包括第一层（201），第二层（202）和第三层（203）。 第一层包括第一材料。 第二层设置在第一层上。 第二层包括第二材料。 第三层设置在第二层上。 第三层包括第三层材料。

公开(公告)号：EP3139400B1

公开(公告)日：2018-02-28

申请号：EP16185874.1

申请日：2016-08-26

Applicant: Kabushiki Kaisha Toshiba

Inventor： Yorisaki, Toma

IPC: H01J49/00 ,  H01J49/14 ,  H01J49/16

CPC classification number: H01J49/0004 ,  H01J49/0009 ,  H01J49/142 ,  H01J49/161

Abstract: According to an embodiment, a position correction sample (20) is used to correct an irradiation position of an ion beam with respect to a sample platform where an analysis object is disposed in mass spectrometry. The position correction sample (20) comprises a stacked body (LB1). The stacked body includes a first layer (201), a second layer (202), and a third layer (203). The first layer includes a first material. The second layer is provided on the first layer. The second layer includes a second material. The third layer is provided on the second layer. The third layer includes a third material.