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公开(公告)号：EP0659286A1
公开(公告)日：1995-06-28
申请号：EP93919305.0
申请日：1993-09-09
发明人： EL-KHOLI, Aida , GÖTTERT, Jost , MOHR, Jürgen , KRIEG, Manfred
CPC分类号： G03F7/039 , C08F265/06 , C08F2/02
摘要： A casting resin composed of 65 to 95 % by weight methylmethacrylate (MMA) with a dissolved solids content from 5 to 35 % by weight polymethylmethacrylate (PMMA), with at least 30000 molecular weight and a weight average Mw which does not exceed 1.3 . 106, is used to produce a positive radiographic resist. A process is also disclosed for producing a radiographic resist, according to which a concentration of 0.2 to 0.4 % by weight azodiisobutyric acid dinitrile (AIBN) is used as initiator and a concentration of less than 0.1 % by weight mercaptane or a non-aromatic mercaptane derivate is used as regulator. The use of said casting resin and this production process allow radiographic resists to be obtained having improved microstructures after exposure to radiation and development.
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公开(公告)号：EP0720756A1
公开(公告)日：1996-07-10
申请号：EP94926193.0
申请日：1994-08-13
CPC分类号： G03F7/2022 , B29C64/135 , B29C2035/0844 , G03F7/00
摘要： The invention relates to a process for producing microstructure bodies tapering as the height increases so that sieves or nets, for example, can be formed by galvanic shaping, the apertures of which are smaller on one side than on the other. The process of the invention comprises the usual steps in the X-ray deep lithography on an X-ray resist; in addition, the X-ray resist is subjected to a second irradiation over the entire surface in which the characteristic dose limit is not attained in the X-ray resist.
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公开(公告)号：EP0659286B1
公开(公告)日：1997-10-29
申请号：EP93919305.8
申请日：1993-09-09
发明人： EL-KHOLI, Aida , GÖTTERT, Jost , MOHR, Jürgen , KRIEG, Manfred
IPC分类号： G03F7/039 , C08F265/06
CPC分类号： G03F7/039 , C08F265/06 , C08F2/02
摘要： A casting resin composed of 65 to 95 % by weight methylmethacrylate (MMA) with a dissolved solids content from 5 to 35 % by weight polymethylmethacrylate (PMMA), with at least 30000 molecular weight and a weight average Mw which does not exceed 1.3 . 106, is used to produce a positive radiographic resist. A process is also disclosed for producing a radiographic resist, according to which a concentration of 0.2 to 0.4 % by weight azodiisobutyric acid dinitrile (AIBN) is used as initiator and a concentration of less than 0.1 % by weight mercaptane or a non-aromatic mercaptane derivate is used as regulator. The use of said casting resin and this production process allow radiographic resists to be obtained having improved microstructures after exposure to radiation and development.
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