公开(公告)号：EP4242361A3

公开(公告)日：2023-11-15

申请号：EP23184258.4

申请日：2018-01-10

申请人： King Abdullah University Of Science And Technology ,  King Fahd University of Petroleum and Minerals

发明人： LI, Xiaohang ,  LI, Kuang-Hui ,  ALOTAIBI, Hamad S.

IPC分类号： H05B6/10 ,  C23C16/458 ,  C23C16/46 ,  C23C16/12 ,  C30B25/12

摘要： Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal component with a top surface and a bottom surface, wherein the top surface is configured to support one or more wafers; a vertical component extending from the bottom surface of the horizontal component along a longitudinal axis that is substantially perpendicular to the horizontal component; and a hollow region within the vertical component. Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal plate with a top surface configured to support one or more wafers, a vertical rod integrated with and perpendicular to the horizontal plate, and a hollow region within the vertical rod for promoting temperature uniformity across the top surface of the horizontal plate.

公开(公告)号：EP4242361A2

公开(公告)日：2023-09-13

申请号：EP23184258.4

申请日：2018-01-10

申请人： King Abdullah University Of Science And Technology ,  King Fahd University of Petroleum and Minerals

发明人： LI, Xiaohang ,  LI, Kuang-Hui ,  ALOTAIBI, Hamad S.

IPC分类号： C30B25/12

摘要： Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal component with a top surface and a bottom surface, wherein the top surface is configured to support one or more wafers; a vertical component extending from the bottom surface of the horizontal component along a longitudinal axis that is substantially perpendicular to the horizontal component; and a hollow region within the vertical component. Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal plate with a top surface configured to support one or more wafers, a vertical rod integrated with and perpendicular to the horizontal plate, and a hollow region within the vertical rod for promoting temperature uniformity across the top surface of the horizontal plate.

公开(公告)号：EP3516090A1

公开(公告)日：2019-07-31

申请号：EP17784011.3

申请日：2017-09-18

申请人： King Abdullah University Of Science And Technology ,  King Fahd University of Petroleum and Minerals

发明人： LI, Xiaohang ,  LI, Kuang-Hui ,  ALOTAIBI, Hamad S.

IPC分类号： C23C16/458 ,  C23C16/46 ,  C30B25/12