公开(公告)号：EP0953166B1

公开(公告)日：2001-08-16

申请号：EP98932356.3

申请日：1998-07-02

申请人： Kodak Polychrome Graphics LLC

发明人： McCULLOUGH, Christopher, David, 8 Pasture Close ,  RAY, Kevin, Barry, 30 Chalner Close ,  MONK, Alan, Stanley, Victor ,  BAYES, Stuart, 10 Chatsworth Mews ,  KITSON, Anthony, Paul

IPC分类号： G03F7/023

CPC分类号： G03F7/2022 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/465 ,  G03F7/022 ,  G03F7/023 ,  G03F7/0233 ,  H05K3/0082

摘要： A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.