公开(公告)号：EP2243859A1

公开(公告)日：2010-10-27

申请号：EP09713077.7

申请日：2009-01-21

申请人： Konica Minolta Holdings, Inc.

发明人： OISHI, Kiyoshi

IPC分类号： C23C16/56 ,  C23C16/509 ,  C23C16/54

CPC分类号： C23C16/56 ,  C23C16/401 ,  C23C16/45563 ,  C23C16/509 ,  C23C16/545 ,  H01J37/32082 ,  H01J37/3277 ,  H01J37/32825 ,  Y10T428/31663

摘要： Provided are a thin film forming method capable of stably forming a homogeneous film at high productivity and a thin film stack obtained thereby. In the thin film forming method, a first discharge space for forming a functional film on a base material under an atmospheric pressure or a pressure near the atmospheric pressure and a second discharge space for post-treating the base material on which the film is formed in the first discharge space are provided. The first discharge space is composed of a pair of roll electrodes and used in a film forming step of forming the functional film on the base material by supplying a mixed gas (1) containing a discharge gas and a thin film forming gas to the first discharge space from a mixed gas supply means to form a high-frequency electric field between the pair of roll electrodes. The second discharge space is located at the outer periphery of one of the roll electrodes and used in a post-treatment step of performing post-treatment by introducing the base material on which the functional film is formed thereinto and introducing a mixed gas (2) containing the discharge gas and a post-treatment gas between a counter electrode and the roll electrode to form a high-frequency electric field between the counter electrode and the roll electrode.

摘要翻译： 提供了能够以高生产率稳定地形成均匀膜的薄膜形成方法和由此获得的薄膜叠层。 在薄膜形成方法中，在大气压或接近大气压的压力下在基材上形成功能膜的第一放电空间和用于后处理形成有膜的基材的第二放电空间 提供第一放电空间。 第一放电空间由一对辊电极组成，用于通过向第一放电供给包含放电气体和薄膜形成气体的混合气体（1）而在基材上形成功能膜的成膜步骤 来自混合气体供给装置的空间构成在一对辊电极之间形成高频电场。 第二放电空间位于一个辊电极的外周，用于通过将形成有功能膜的基材引入其中并引入混合气体（2）的后处理步骤， 在对电极和辊电极之间含有放电气体和后处理气体，以在对电极和辊电极之间形成高频电场。