公开(公告)号：EP4297537A3

公开(公告)日：2024-03-20

申请号：EP23209856.6

申请日：2010-04-27

申请人： AES Global Holdings, Pte. Ltd.

发明人： HECKMAN, Randy ,  BROUK, Victor

IPC分类号： H02M7/48 ,  H01L21/3065 ,  C23C16/509 ,  H02M3/00 ,  H02M3/158 ,  H01J37/32

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion- energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.

公开(公告)号：EP4297619A2

公开(公告)日：2024-01-03

申请号：EP22712687.7

申请日：2022-03-03

申请人： Yeti Coolers, LLC

发明人： BRUNET, Colby

IPC分类号： A47J36/02 ,  C23C16/27 ,  A47J41/02 ,  B65D81/38 ,  C23C16/04 ,  C23C16/26 ,  C23C16/509

公开(公告)号：EP4214351A1

公开(公告)日：2023-07-26

申请号：EP21786758.9

申请日：2021-09-14

申请人： centrotherm international AG

发明人： TRÖLLER, Mirko ,  FUCHS, Jens-Uwe ,  REIZE, Ralf ,  LEICHTLE, Roland

IPC分类号： C23C16/458 ,  C23C16/509 ,  H01J37/32 ,  H01L21/67

公开(公告)号：EP3794628A1

公开(公告)日：2021-03-24

申请号：EP19787352.4

申请日：2019-10-01

申请人： Oxford Instruments Nanotechnology Tools Limited

发明人： PROUDFOOT, Gary ,  WATERS, Gareth ,  PETER, Annika ,  COOKE, Mike ,  O'MAHONY, Aileen

IPC分类号： H01J37/32 ,  C23C16/509

公开(公告)号：EP2743970B1

公开(公告)日：2021-01-06

申请号：EP12821685.0

申请日：2012-05-22

发明人： MURAKAMI, Shoichi ,  HATASHITA, Masayasu

IPC分类号： H01L21/318 ,  C23C16/34 ,  C23C16/505 ,  C23C16/52 ,  C23C16/509 ,  H01L21/02 ,  H01L21/66

公开(公告)号：EP2721196B1

公开(公告)日：2019-10-30

申请号：EP12727095.7

申请日：2012-06-11

申请人： Tenneco Inc.

发明人： AHARONOV, Robert, R.

IPC分类号： C23C16/509 ,  C23C28/04 ,  C23C28/00 ,  C23C16/24 ,  C23C16/26 ,  C23C16/22 ,  C23C16/30 ,  C23C16/32

公开(公告)号：EP2147988B1

公开(公告)日：2019-03-27

申请号：EP07832348.2

申请日：2007-11-22

申请人： Mitsubishi Heavy Industries Machinery Systems, Ltd. ,  KIRIN BEER KABUSHIKI KAISHA

发明人： ASAHARA,Yuji ,  YAMAKOSHI, Hideo ,  DANNO, Minoru ,  GOTO, Seiji ,  SHIRAKURA, Akira ,  NAKAYA, Masaki ,  HIROYA, Kiyoshi

IPC分类号： C23C16/509 ,  B65D23/02 ,  B65D25/14 ,  H05H1/46 ,  C23C16/04 ,  H01J37/32 ,  H05H1/24

公开(公告)号：EP3206223A4

公开(公告)日：2018-06-06

申请号：EP15849097

申请日：2015-09-25

申请人： TOKYO ELECTRON LTD

发明人： HIRAYAMA YUSUKE ,  MIYAGAWA MASAAKI

IPC分类号： H01L21/3065 ,  C23C16/02 ,  C23C16/42 ,  C23C16/44 ,  C23C16/50 ,  C23C16/509 ,  H01J37/32 ,  H01L21/205 ,  H05H1/46

CPC分类号： H01J37/32009 ,  B29C59/14 ,  C23C16/0272 ,  C23C16/44 ,  C23C16/4404 ,  C23C16/509 ,  H01J37/32082 ,  H01J37/32165 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32532 ,  H01J37/32917 ,  H01J2237/334 ,  H01L21/205 ,  H01L21/3065 ,  H05H1/46

摘要： To protect a member within a chamber from a plasma, thereby preventing the member from change of the properties and consumption. This plasma processing method comprises a film formation step, a plasma processing step, and a removal step. In the film formation step, a silicon-containing film is formed on the surface of a member within a chamber by means of plasmas of a silicon-containing gas and a reducing gas. In the plasma processing step, an object to be processed introduced into the chamber is plasma-processed by means of a plasma of a processing gas after the formation of the silicon-containing film on the surface of the member. In the removal step, the silicon-containing film is removed from the surface of the member by means of a plasma of a fluorine-containing gas after the plasma-processed object is carried out of the chamber.

公开(公告)号：EP2316253B1

公开(公告)日：2018-05-23

申请号：EP09806941.2

申请日：2009-08-06

申请人： Lam Research Corporation

发明人： DHINDSA, Rajinder

IPC分类号： H05H1/34 ,  H01L21/3065 ,  H01L21/203 ,  H01L21/205 ,  H01L21/265 ,  C23C16/455 ,  C23C16/509 ,  H01J37/32

CPC分类号： H01L21/67069 ,  C23C16/45565 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01J37/32605 ,  Y10T29/49002 ,  Y10T29/4913 ,  Y10T29/49401 ,  Y10T29/49428 ,  Y10T29/49769 ,  Y10T29/49895 ,  Y10T29/49959 ,  Y10T156/10

摘要： A showerhead electrode for a plasma processing apparatus includes an interface gel between facing surfaces of an electrode plate and a backing plate. The interface gel maintains thermal conductivity during lateral displacements generated during temperature cycling due to mismatch in coefficients of thermal expansion. The interface gel comprises, for example, a silicone based composite filled with aluminum oxide microspheres. The interface gel can conform to irregularly shaped features and maximize surface contact area between mating surfaces. The interface gel can be pre-applied to a consumable upper electrode.

公开(公告)号：EP2744924B1

公开(公告)日：2015-11-18

申请号：EP12784055.1

申请日：2012-08-14

申请人： Ecosolifer AG

发明人： VADADI, Zsolt ,  STRAUSZ, Tamás ,  NÉMETH, Péter

IPC分类号： C23C16/455 ,  C23C16/509 ,  C23C16/458

CPC分类号： C23C16/45504 ,  C23C16/45514 ,  C23C16/45563 ,  C23C16/4587 ,  C23C16/509