NEUTRON SHIELDING MATERIAL AND METHOD FOR PRODUCING SAME

    公开(公告)号:EP4435801A1

    公开(公告)日:2024-09-25

    申请号:EP22895498.8

    申请日:2022-11-09

    IPC分类号: G21F1/10 G21F3/00

    CPC分类号: G21F1/10 G21F3/00 G21F1/06

    摘要: Provided is a neutron shielding material having good light transparency and excellent shielding performance against thermal neutron rays, and a method for producing the same. A neutron shielding material according to the present invention includes a light transmitting material and a boron compound enriched in a boron isotope having a mass number of 10, the neutron shielding material being formed of a molded product having light transparency. Shielding performance against thermal neutron rays is improved by containing a boron compound enriched in a boron isotope having a mass number of 10. As a result, the neutron shielding material can be widely applied to members requiring visibility and neutron blocking properties.

    PROCESS LIQUID FOR SEMICONDUCTOR DEVICE, PROCESSING METHOD, AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR
    3.
    发明公开
    PROCESS LIQUID FOR SEMICONDUCTOR DEVICE, PROCESSING METHOD, AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR 审中-公开
    开发商乳液适合用于半导体生产半导体组件,开发方法和装置

    公开(公告)号:EP1780778A1

    公开(公告)日:2007-05-02

    申请号:EP05757755.3

    申请日:2005-07-11

    IPC分类号: H01L21/308 H01L21/304

    CPC分类号: H01L21/02063

    摘要: Disclosed is a process liquid which causes only little dissolution of atoms from a semiconductor surface and enables to form a clean and flat semiconductor surface. Also disclosed are a processing method and an apparatus for manufacturing a semiconductor. Specifically disclosed is a process liquid which causes only little dissolution of atoms from a semiconductor surface by using an aqueous solution containing at least one alcohol or ketone, thereby realizing a clean and flat surface.

    摘要翻译: 公开了一种处理液,其从半导体表面仅引起原子的小的溶解和能够形成一个干净的和平坦的半导体表面。 所以圆盘游离缺失是一个处理方法和装置,用于制造半导体。 具体盘游离缺失是通过使用在含有至少一个醇或酮wässrige溶液,由此实现了清洁且平坦的表面仅引起从半导体表面原子的小的溶解的处理液。