公开(公告)号：EP1733806A1

公开(公告)日：2006-12-20

申请号：EP04821887.9

申请日：2004-11-16

申请人： M'SKC, Ltd.

发明人： MOTOJIMA, Makoto

IPC分类号： B05D7/24 ,  C02F1/48 ,  C02F1/68 ,  C03C17/25 ,  C08J7/06 ,  C23C26/00

CPC分类号： C02F1/481 ,  C02F1/48 ,  C02F1/688 ,  C02F9/00 ,  C02F2301/066 ,  C03C17/25 ,  C03C2217/213 ,  C03C2217/214 ,  C03C2218/115 ,  C23C26/00

摘要： The present invention is an invention relating to the technique of forming an inorganic film which realizes an inorganic film excellent in durability and of the low cost, making the previous wax or polymer processing unnecessary. The apparatus of the present invention consists of a charged water producing tank 1, a magnetic field treating tank 2 and a film forming tank 3. The charged water producing tank 1 is provided with a raw water supplying port 11, a charged water b taking out port 12, and a ceramic particle-filled part 13 in which an infinite number of ceramic particles 14 containing at least silicon and aluminum as a dissolving out component are filled therein. The magnetic field treating tank 2 is provided with a charged water feeding port 21 and a magnetic field-treated water c taking out port 22, in which an S poll 23a and an N poll 23b for forming an electromagnetic field are arranged, and the tank has a passage water path 24 for passage of charged water b therebetween. The film forming tank 3 is provided with a magnetic field-treated water c feeding port 31 and a treated waste water d taking out port 32, and is provided with a nozzle 34 for spraying pressurized magnetic field-treated water c to a surface of a work 33 arranged in the tank.

摘要翻译： 本发明是关于无机膜形成技术的发明，其实现了耐久性优异，成本低廉的无机膜，不需要先前的蜡或聚合物处理。 本发明的装置由带电水的制造槽1，磁场处理槽2和成膜槽3构成。充水生成槽1设有原水供给口11，取出水 端口12和陶瓷颗粒填充部分13，其中填充有至少含有硅和铝作为溶出部分的无数个陶瓷颗粒14。 磁场处理槽2设置有充电水供给口21和磁场处理水c取出口22，其中布置有用于形成电磁场的S轮廓23a和N轮廓23b，并且该坦克 具有用于通过带电水b的通道水路24。 成膜槽3设置有磁场处理水c进料口31和处理废水d取出口32，并且设置有喷嘴34，用于将加压磁场处理水c喷涂到 工作33安排在坦克中。