公开(公告)号：EP0903777A1

公开(公告)日：1999-03-24

申请号：EP97946114.2

申请日：1997-12-04

申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

发明人： OHKUNI, Mitsuhiro ,  KUGO, Shunsuke Room 303 ,  SASAKI, Tomoyuki ,  TATEIWA, Kenji ,  NIKOH, Hideo

IPC分类号： H01L21/302 ,  G03F7/26

CPC分类号： G03F7/091 ,  H01L21/31138 ,  H01L21/32139

摘要： After an organic bottom anti-reflective coating (12) is deposited on an underlying film (11), a resist pattern (15) is formed on the organic bottom anti-reflective coating (12). Dry etching is performed with respect to the organic bottom anti-reflective coating (12) masked with the resist pattern (15) to form an anti-reflective coating pattern. The dry-etching of the organic bottom anti-reflective coating (12) is performed by using etching gas containing gas having the S component such as SO 2 /O 2 -based etching gas or COS/O 2 -based etching gas.