公开(公告)号：EP2475001A4

公开(公告)日：2018-01-10

申请号：EP10813774

申请日：2010-09-02

申请人： MERCK PATENT GMBH

发明人： OZAKI YUKI ,  HAYASHI MASANOBU

IPC分类号： H01L21/316 ,  C04B35/14 ,  C04B35/622 ,  C08G77/62 ,  C09D183/16 ,  C23C18/12 ,  H01L21/02

CPC分类号： C23C18/1208 ,  C04B35/14 ,  C04B35/62218 ,  C04B2235/483 ,  C08G77/62 ,  C09D183/16 ,  C23C18/122 ,  H01L21/02164 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02326

摘要： The present invention provides a method for forming a siliceous film. According to the method, a siliceous film having a hydrophilic surface can be formed from a polysilazane compound at a low temperature. In the method, a composition containing a polysilazane compound and a silica-conversion reaction accelerator is applied on a substrate surface to form a polysilazane film, and then a polysilazane film-treatment solution is applied thereon so that the polysilazane compound can be converted into a siliceous film at 300°C or less. The polysilazane film-treatment solution contains a solvent, hydrogen peroxide and an alcohol.