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    SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME
    1.
    发明公开
    SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME 审中-公开
    合成非晶态硅氧烷粉末及其制造方法

    公开(公告)号：EP2522629A4

    公开(公告)日：2014-03-26

    申请号：EP10842212

    申请日：2010-12-24

    申请人： MITSUBISHI MATERIALS CORP

    发明人： UEDA TOSHIAKI

    IPC分类号： C01B33/18 ,  B01J19/08 ,  B07B4/02 ,  B22F1/00 ,  C01B33/14 ,  C03C3/06

    CPC分类号： C03B19/1065 ,  C01B33/14 ,  C01B33/18 ,  C01B33/181 ,  C01P2004/03 ,  C01P2004/32 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2006/12 ,  C03B19/1095 ,  C03B2201/02 ,  C03C3/06 ,  C03C23/0075 ,  Y10T428/2982

    摘要： The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D 50 of 10 to 2,000µm; wherein the synthetic amorphous silica powder has: a quotient of 1. 00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D 50 ; a real density of 2.10 to 2.20g/cm 3 ; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and an unmolten ratio of 0.00 to 0.25. This synthetic amorphous silica powder is less in amount of gas components adsorbed to surfaces of particles of the powder and in amount of gas components within the particles, so that a synthetic silica glass product manufactured by using the powder is remarkably decreased in amount of generation or degree of expansion of gas bubbles even upon usage of the product in a high temperature and reduced pressure environment.

    SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME
    2.
    发明公开
    SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME 审中-公开

    公开(公告)号：EP2522628A4

    公开(公告)日：2014-03-26

    申请号：EP10842210

    申请日：2010-12-24

    申请人： MITSUBISHI MATERIALS CORP

    发明人： UEDA TOSHIAKI

    IPC分类号： C01B33/18 ,  B01J19/08 ,  B07B4/02 ,  B22F1/00 ,  C03C3/06

    CPC分类号： C01B33/181 ,  C01B33/14 ,  C01P2002/02 ,  C01P2002/82 ,  C01P2004/03 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2006/12 ,  C03B19/1025 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2203/10 ,  C03C2203/27 ,  Y10T428/2982

    摘要： The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D 50 of 10 to 2, 000µm; wherein the synthetic amorphous silica powder has: a quotient of 1. 00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D 50 ; a real density of 2.10 to 2.20g/cm 3 ; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00. This synthetic amorphous silica powder is less in amount of gas components adsorbed to surfaces of particles of the powder and in amount of gas components within the particles, so that a synthetic silica glass product manufactured by using the powder is remarkably decreased in amount of generation or degree of expansion of gas bubbles even upon usage of the product in a high temperature and reduced pressure environment.

    SYNTHETIC AMORPHOUS SILICA POWDER AND PROCESS FOR MANUFACTURING SAME
    4.
    发明公开
    SYNTHETIC AMORPHOUS SILICA POWDER AND PROCESS FOR MANUFACTURING SAME 审中-公开
    SYNTHETISCHES AMORPHES SILICAPULVER UND VERFAHREN ZUR HERSTELLUNG DAVON

    公开(公告)号：EP3100980A4

    公开(公告)日：2017-08-16

    申请号：EP14881102

    申请日：2014-12-10

    申请人： MITSUBISHI MATERIALS CORP

    发明人： UEDA TOSHIAKI

    IPC分类号： C01B33/12 ,  C01B33/18

    CPC分类号： C01B33/18 ,  C01P2002/02 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2006/10 ,  C01P2006/12 ,  C01P2006/80

    摘要： The purpose of the present invention is to provide: a synthetic amorphous silica powder which is suitable as a raw material for a synthetic silica glass product used in a high-temperature and reduced-pressure environment, which can yield a synthetic silica product such that the occurrence or expansion of air bubbles in the glass product is inhibited even in use in a high-temperature and reduced-pressure environment, and which can be obtained at a relatively low cost; and a process for manufacturing the same. A synthetic amorphous silica powder obtained by subjecting silica as a raw material to granulation and firing, characterized in that (1) the particle diameter (D v50 ) at a cumulative frequency of 50% in the volume-based particle size distribution, (2) the cumulative frequency of particles having volume-based diameters of 45µm or less, (3) the value (D v90 -D v10 )/D v50 obtained by dividing the difference between the particle diameter (D v90 ) at a cumulative frequency of 90% in the volume-based particle size distribution and the particle diameter (D v10 ) at a cumulative frequency of 10% therein by the particle diameter (D v50 ) at a cumulative frequency of 50% therein, (4) the F NL /F NS ratio of the frequency (F NL ) of a frequency peak in the number-based particle size distribution to the frequency (F NS ) of a frequency peak in the region of particle diameters of 30ppm or less in the number-based particle size distribution, and (5) the bulk density are within prescribed ranges respectively.

    摘要翻译： 本发明的目的在于提供一种合成无定形二氧化硅粉末，该合成无定形二氧化硅粉末适合作为在高温减压环境下使用的合成二氧化硅玻璃产品的原料，该合成二氧化硅粉末可以得到合成二氧化硅产品， 即使在高温减压环境下使用，玻璃制品中的气泡的产生或膨胀也被抑制，并且可以以相对低的成本获得; 及其制造方法。 其特征在于，（1）体积基准粒度分布中累积频率为50％时的粒径（D v50），（2）基于体积基准的粒度分布中累积频率50％ 体积基准直径为45μm以下的颗粒的累积频率，（3）累积频率90％以上的粒径（D v90）之差除以（D v90 -D v10）/ D v50得到的值 （4）F NL / F NS的体积基准粒度分布和累积频率10％处的累积频率（D v10）的粒径（D v50） 基于数量的粒度分布中的频率峰值的频率（F NL）与基于数量的粒度分布中的粒径区域中的频率峰值的频率（F NS）之比为30ppm以下， （5）体积密度在规定范围内 espectively。