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    HOMOGENOUS SILICA-TITANIA GLASS
    2.
    发明公开
    HOMOGENOUS SILICA-TITANIA GLASS 审中-公开

    公开(公告)号：EP4328200A1

    公开(公告)日：2024-02-28

    申请号：EP23193555.2

    申请日：2023-08-25

    Applicant: Corning Incorporated

    Inventor： Campion, Michael John ,  Hrdina, Kenneth Edward ,  LeBlond, Nicolas ,  Maxon, John Edward

    IPC: C03C3/06 ,  C03C4/00 ,  G03F7/00 ,  C03B19/02 ,  C03B32/00 ,  C03B19/06

    Abstract: A glass including silica and titania is disclosed. An average hydroxide concentration of a plurality segments of the glass is in a range from about 600 ppm to about 1300 ppm, an average titania concentration of the plurality of segments is in a range from about 6 wt.% to about 12 wt.%, and each segment of the plurality of segments has a length of about 12.7 mm, a width of about 12.7 mm, and a height of about 7.62 mm. The hydroxide concentration of each segment is measured using a Fourier transform infrared spectroscopy in transmission, the refractive index is measured using an optical interferometer with a 633 nm operating wavelength and a resolution of 270 microns x 270 microns pixel size, and the average titania concentration is determined based upon the measured refractive index.

    GLASS AND METHOD FOR PRODUCING THE SAME, AND MEMBER AND APPARATUS USING THE SAME
    7.
    发明公开
    GLASS AND METHOD FOR PRODUCING THE SAME, AND MEMBER AND APPARATUS USING THE SAME 审中-公开

    公开(公告)号：EP4082976A1

    公开(公告)日：2022-11-02

    申请号：EP22168468.1

    申请日：2022-04-14

    Applicant: Tosoh Corporation

    Inventor： ITO, Masahiro ,  ARAI, Kazuyoshi

    IPC: C03C3/062 ,  H01L21/00 ,  C03B20/00 ,  C03C3/06 ,  C03B11/00

    Abstract: A glass comprising at least one oxide of Si and a di- or higher-valent metal element, the glass containing no bubbles with diameters of more than 0.1 mm, wherein an occupied area fraction of bubbles with diameters of 0.1 mm or less is 0.05% or less. A semiconductor production apparatus and a liquid crystal production apparatus comprising a glass member comprising this glass. A method for producing a glass, comprising the steps of (1) placing raw material powders for at least one oxide of Si and a di- or higher-valent metal element in a container, mixing the raw material powders together and then melting the mixture by heating under reduced pressure to obtain a melt; (2-1) pressurizing the melt in a He gas atmosphere, or (2-2) heating the melt in an inert gas atmosphere other than a He gas atmosphere and then pressurizing the melt in the inert gas atmosphere; and (3) cooling the melt.

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