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1.发明公开Method of burning waste gases from semiconductor-manufacturing processes and an apparatus for burning the waste gases 失效一种用于废气从半导体制造工艺和设备中的燃烧这些气体的燃烧过程。
公开(公告)号：EP0262561A2
公开(公告)日：1988-04-06
申请号：EP87113840.0
申请日：1987-09-22
发明人： Deai, Kazuo , Yamazaki, Norio
IPC分类号： F23G7/06
CPC分类号： F23G7/065 , F23G2209/142 , Y02E20/344
摘要： Waste gases (1) containing noxious components are flowed through the inner tube (31) of the burner (3) of a burning apparatus (2), a secondary fuel gas (4) is fed into a space formed between the inner tube (31) and an outer (32) tube of the burner, and air or oxygen-rich air (5) is supplied to the burning apparatus, whereby the noxious components are burnt at a position apart from the free end of the burner.
摘要翻译： （1）含有的有害成分的废气通过燃烧器（3）的燃烧装置（2），二次燃料气体（4）被供给到内管之间形成的空间的内管（31）流动（31 ）和燃烧器，和空气或富氧空气5）的（外（32），管被供给到燃烧装置，由此，有害组分在一个位置从燃烧器的自由端燃烧开。
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2.发明公开Method of burning waste gases from semiconductor-manufacturing processes and an apparatus for burning the waste gases 失效从半导体制造工艺中焙烧废气的方法和用于燃烧废气的装置
公开(公告)号：EP0262561A3
公开(公告)日：1988-08-03
申请号：EP87113840
申请日：1987-09-22
发明人： Deai, Kazuo , Yamazaki, Norio
IPC分类号： F23G07/06
CPC分类号： F23G7/065 , F23G2209/142 , Y02E20/344
摘要： Waste gases (1) containing noxious components are flowed through the inner tube (31) of the burner (3) of a burning apparatus (2), a secondary fuel gas (4) is fed into a space formed between the inner tube (31) and an outer (32) tube of the burner, and air or oxygen-rich air (5) is supplied to the burning apparatus, whereby the noxious components are burnt at a position apart from the free end of the burner.
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