公开(公告)号：EP0114714A3

公开(公告)日：1984-08-22

申请号：EP84200065

申请日：1984-01-20

申请人： N.V. Philips' Gloeilampenfabrieken

发明人： Rao, Nidamboor Vasanth

IPC分类号： H01J29/48 ,  H01J31/38

CPC分类号： H01J29/484 ,  H01J29/488 ,  H01J31/38

摘要： Disclosed is an electron gun comprising a cathode, a first apertured anode spaced from said cathode and operated at a potential of between 5 and 30 volts positive with respect to the cathode. The gun further comprises a second apertured anode spaced from the first anode and operating at a potential of between 100 and 400 volts positive with respect to the cathode to produce a lens field in the region between the anodes which focusses the electrons emitted from the cathode at a crossover therebetween. The cross-section of the beam produced by the gun is determined by the size of the aperture in the second anode and the beam current may be varied by changing the voltage on the first anode to thereby move the crossover closer to or further away from the second anode so that a larger or smaller portion, respectively, of the electrons in the beam passes through the aperture. Alternatively, a beam-limiting element, separate from the second anode, may be used.