摘要:
This invention relates to resin material for gas separation base containing a cardo polyimide structure in which the hydrogen atoms in the side-chain benzyl and/or allyl position are halogenated at a rate of modification by halogen of 0.1% or more or resin material for gas separation base containing polymer in which the hydrogen atoms in the side-chain benzyl and/or allyl position are halogenated at a rate of modification by halogen of 34% or more and, additionally, relates to polymer which serves as raw material for the aforementioned resin material for gas separation base containing a cardo polymer structure and a process for producing said polymer; said polymer not only excels in such properties as solvent solubility, ease of conversion to film by a wet process, thermal stability, and chemical stability but also performs well in gas permeability and the process of this invention makes it possible to produce gas separation base, particularly gas separation membrane, whose gas permeability and gas selectivity can be readily controlled.
摘要:
Compounds represented by general formula (I) and medicinal preparations, in particular, platelet aggregation inhibitors, blood coagulation inhibitors for systemic circulation, and coronary reinfarction inhibitors, wherein A represents a tertiary amine; R3 represents hydrogen, lower alkyl, lower alkenyl, lower alkynyl, lower aralkyl, or aryl; R4 represents hydrogen, optionally substituted lower alkyl, lower alkenyl, lower alkynyl, optionally substituted lower aralkyl, optionally substituted lower aralkenyl, optionally substituted lower aralkynyl, optionally substituted aryl, optionally substituted heterocycle, optionally substituted cycloalkyl, optionally substituted cycloalkenyl, optionally substituted cycloalkynyl or lower alkoxy; P and Q represent each lower alkyl or P and Q are combined to form cycloalkyl together with the adjacent carbon atom; R5 represents hydrogen or a carboxy-protective group; X represents nitrogen or CH; Y1 and Y2 represent each hydrogen, lower alkyl, halogeno, hydroxy, lower alkoxy, lower acyloxy, acyl, carboxy, lower alkoxycarbonyl, nitro or trifluoromethyl; and m is an integer of 0 to 2.