利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

2 条记录 (耗时 0.008 秒)

    Work supplying method and apparatus to batch process apparatus for semiconductor wafer
    1.
    发明公开
    Work supplying method and apparatus to batch process apparatus for semiconductor wafer 失效
    方法和装置用于向Werskstückzufuhr用于半导体晶片的串行处理设备

    公开(公告)号：EP0775952A2

    公开(公告)日：1997-05-28

    申请号：EP96118364.7

    申请日：1996-11-15

    申请人： NEC CORPORATION

    发明人： Togashi, Yoichi

    IPC分类号： G05B19/418

    CPC分类号： G05B19/4189 ,  G05B19/41835 ,  G05B2219/32077 ,  G05B2219/32078 ,  G05B2219/45027 ,  Y02P90/12 ,  Y02P90/265 ,  Y02P90/28

    摘要： A processing end time calculation section (11) of a batch formation control section (6) refers to a history file (8) in response to a processing start report from a batch process apparatus (1, 1a) to predict a processing end time. A work extraction section (12) refers to a step management file (9) to extract those of the works which can arrive at a batch process apparatus (1, 1a) on or prior to the thus predicted processing end time. A batch formation section (13) forms, designating the thus extracted works as an object of batch formation, the works into a batch such that one of the works which has the highest preferential degree is designated as a top work of the batch. A transport section (4) transports the works of the batch collectively to the batch process apparatus (1, 1a).