摘要:
A plasma generating electrode (1) is composed of a pair of electrodes (5), and at least one electrode (5a) of which pair comprises a platelike ceramic body (2) as a dielectric body and a plurality of conductive films (3) arranged within the ceramic body (2). Each conductive film (3) has a plurality of through holes (4) arranged in a certain pattern, and the through holes (4) are so formed as to penetrate the conductive film in the thickness direction. The cross-section of each through hole (4) perpendicular to the thickness direction partially has an arc. The arrangement pattern of through holes (4a) of at least one conductive film (3a) is so formed as to be different from the arrangement pattern of through holes (4b) formed in another conductive film (3b). Due to these different arrangement patterns of through holes (4) in the conductive films (3), plasmas in different states are generated at the same time when a voltage is applied between the pair of electrodes (5), thereby enabling the plasma generating electrode (1) to generate plasmas in different states at the same time.
摘要:
An exhaust gas treating apparatus (1) has a case body (2) and plasma producing means (3) that is capable of producing plasma inside the case body (2) and treats substances contained in an exhaust gas by the plasma. The plasma producing means (3) has one or more each of a pulse electrode (4) and a ground electrode (5) that are opposedly arranged in the case body (2) and has a pulse power source (6) capable of feeding a pulse current to the pulse electrode (4) while switching frequency and/or voltage for different values at predetermined time intervals. Frequency and/or voltage is switched for different values at predetermined time intervals, so that plasma of a kind adequate for substances contained in an exhaust gas is produced between the pulse electrode (4) and the ground electrode (5). As a result, the substances to be treated in the exhaust gas can be selectively treated.