Abstract:
A holder of an electroconductive contactor comprises a silicon wafer having a multilayer structure in which a silicon oxide film having a thickness of, say, around 1 mu m is formed between first and second silicon layers. A small-diameter hole for guiding the head of an electroconductive needle body is made in the first silicon layer, and a large-diameter hole for receiving a flange portion of the needle body and a helical compression spring is made in the second silicon layer. A stopper against which the flange portion is struck is formed with a silicon oxide layer. The surface of the first silicon layer is machined, for example, lapped, and therefore the projection of the needle body is restricted with high precision. Since the holder is made of the same material as that of an object to be measured and therefore the thermal expansion coefficients thereof are the same, the relative positions of needle bodies are not displaced even under a test in a high-temperature atmosphere when the silicon wafer is inspected by multi-point measurement.