SUBSTRATE POSITION ALIGNER
    1.
    发明公开
    SUBSTRATE POSITION ALIGNER 审中-公开
    基板位置对齐器

    公开(公告)号:EP2973677A1

    公开(公告)日:2016-01-20

    申请号:EP14770295.5

    申请日:2014-02-20

    IPC分类号: H01L21/68

    摘要: A substrate position aligner includes a substrate holding assembly, a plurality of rollers, a rotation mechanism, and a sensor. The substrate holding assembly is configured to hold a substrate in a vertical orientation. The plurality of rollers include at least two idler rollers and a drive roller. Each roller has a point on its perimeter spaced on a common radius from a center of substrate rotation defined within the substrate holding assembly. The sensor is positioned approximately on the common radius and configured to detect the presence of an orientation cut in the substrate when the orientation cut is not orientated within a range between about - 44 degrees and about + 44 degrees from horizontal. A method of aligning a substrate having an orientation cut includes sensing a presence of the orientation cut when the orientation cut is not orientated within the above recited range.

    摘要翻译: 基板位置调准器包括基板保持组件,多个滚轮,旋转机构以及传感器。 衬底保持组件被配置为以垂直方向保持衬底。 多个辊包括至少两个惰辊和驱动辊。 每个滚筒在其周边上具有与衬底保持组件内限定的衬底旋转中心在同一半径上的点。 传感器大致位于公共半径上并被配置为当定向切割未定向在与水平线成大约-44度至大约+44度之间的范围内时检测在基板中存在定向切割。 对准具有定向切割的衬底的方法包括当定向切割未定向在上述范围内时感测定向切割的存在。

    Stage system and stage driving method for use in exposure apparatus
    2.
    发明公开
    Stage system and stage driving method for use in exposure apparatus 有权
    阶段系统和载置台驱动方法,用于曝光装置

    公开(公告)号:EP1965411A3

    公开(公告)日:2012-08-08

    申请号:EP08009497.2

    申请日:1999-07-28

    IPC分类号: H01L21/00 G03F7/20

    摘要: A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one of the position and movement amount of the stage, and a second measuring system for measuring at least one of the position and movement amount of one of the first unit and the structure, wherein the stage is controlled on the basis of a measured value of the first measuring system, and wherein the moving system is controlled on the basis of a measured value of the second measuring system.

    DATA MANAGEMENT
    3.
    发明公开
    DATA MANAGEMENT 审中-公开
    数据管理

    公开(公告)号:EP2191411A4

    公开(公告)日:2011-06-22

    申请号:EP08795382

    申请日:2008-08-15

    申请人: NCR CORP

    IPC分类号: G06F21/24 G06Q10/00

    摘要: A package is provided for use with a track-and-trace data management system. The package comprises a base defining a plurality of compartments, each compartment containing an item, and a cover enclosing the compartments to retain each item inside a respective compartment. Each item carries a unique item code, and the package includes at least one unique security code. The relationship between the unique item code and the at least one unique security code is maintained by the data management system.

    WAFER LEVEL BURN-IN METHOD AND WAFER LEVEL BURN-IN SYSTEM
    6.
    发明公开
    WAFER LEVEL BURN-IN METHOD AND WAFER LEVEL BURN-IN SYSTEM 审中-公开
    VERFAHREN UND SYSTEM ZUM BURN-IN AUF WAFEREBENE

    公开(公告)号:EP1921671A1

    公开(公告)日:2008-05-14

    申请号:EP06746964.3

    申请日:2006-05-29

    IPC分类号: H01L21/66

    摘要: A temperature regulation plate 106 is divided into at least two areas, a heater 408 for applying a temperature load in correspondence with such areas and its control system are divided and controlled independently to set temperatures, and a cooling source is controlled by comparing the measurements from temperature sensors 409 arranged in respective areas for controlling the heater 408 and switching the measurement for calculating the control output sequentially thus reducing variation in in-plane temperature of a wafer due to heating when an electric load is applied. Since consumption and burning of a probe are prevented, highly reliable wafer level burn-in method and apparatus can be provided.

    摘要翻译: 温度调节板106被分成至少两个区域,加热器408用于对应于这些区域施加温度负荷,并且其控制系统被独立地分开和控制以设定温度,并且通过将来自 温度传感器409布置在用于控制加热器408的相应区域中,并且顺序地切换用于计算控制输出的测量值,从而当施加电负载时减少由于加热导致的晶片的面内温度的变化。 由于防止了探测器的消耗和燃烧,因此可提供高可靠性的晶片级老化方法和装置。