公开(公告)号：EP3184242A1

公开(公告)日：2017-06-28

申请号：EP15834152.9

申请日：2015-06-09

Applicant: NHK Spring Co., Ltd.

Inventor： MORIYAMA, Senri ,  AKIYAMA, Satoshi ,  KOMAZAKI, Masaya ,  NAGAYASU, Go ,  OKADA, Hideki ,  YOKOTA, Daisuke

IPC: B24C1/10 ,  B24C3/24 ,  F16F1/02

CPC classification number: B24C1/10 ,  B24C3/24 ,  F16F1/02 ,  F16F1/04

Abstract: A vertical motion impeller-type shot peening device (50) performs a second shot peening to a coil spring (10) including first shot peening indentations (20). The vertical motion impeller-type shot peening device (50) includes a workpiece holding mechanism (52) including a lower end turn support (84, 85) and an upper end turn support (95, 96), a stress applying mechanism (90) which compresses the coil spring (10), a rotation mechanism (100) which allows the coil spring (10) to rotate around the vertical axis, and a projection mechanism (57) which includes a pair of vertically movable impeller units (55, 56). A first rough surface (21) including first shot peening indentations (20) is formed on a part of end turn portions (10a, 10b) of the coil spring (10). A second rough surface (31) including second shot peening indentations (30) is formed on the entire surface of wire (11) except for the first rough surface (21).

Abstract translation: 垂直运动叶轮式喷丸装置（50）对包括第一喷丸硬化压痕（20）的螺旋弹簧（10）执行第二喷丸。 上下运动叶轮式喷丸装置（50）包括：包括下端匝支承件（84,85）和上端匝支承件（95,96）的工件保持机构（52）;应力施加机构（90） 压缩螺旋弹簧10的旋转机构100，使螺旋弹簧10绕垂直轴旋转的旋转机构100和包括一对可垂直移动的叶轮单元55,56的投射机构57， ）。 包括第一喷丸压痕（20）的第一粗糙表面（21）形成在螺旋弹簧（10）的一部分端部转弯部分（10a，10b）上。 包括第二喷丸硬化凹痕（30）的第二粗糙表面（31）形成在除第一粗糙表面（21）之外的金属丝（11）的整个表面上。

公开(公告)号：EP3421177B1

公开(公告)日：2020-10-21

申请号：EP17756615.5

申请日：2017-02-23

Applicant: NHK Spring Co., Ltd.

Inventor： OKADA, Hideki ,  YOKOTA, Daisuke ,  MORIYAMA, Senri ,  AKIYAMA, Satoshi ,  KOMAZAKI, Masaya ,  NAGAYASU, Go

IPC: B24C1/10 ,  B24C3/24 ,  B24C9/00

公开(公告)号：EP3421177A1

公开(公告)日：2019-01-02

申请号：EP17756615.5

申请日：2017-02-23

Applicant: NHK Spring Co., Ltd.

Inventor： OKADA, Hideki ,  YOKOTA, Daisuke ,  MORIYAMA, Senri ,  AKIYAMA, Satoshi ,  KOMAZAKI, Masaya ,  NAGAYASU, Go

IPC: B24C1/10 ,  B24C3/24 ,  B24C9/00

Abstract: A coil spring processing device includes an end positioning device (30), shot peening device (50), and controller (98). The end positioning device (30) positions ends (1c, 1d) of a coil spring (1). The shot peening device (50) includes a turntable mechanism (52), pressure mechanism (93), rotation mechanism (100) which rotates the coil spring (1), and projection mechanism (57) which projects shots. Holding mechanisms (81, 82) each include a lower shifting prevention jig (85) and an upper shifting prevention jig (91). The controller (98) stops a first holding mechanism (81) and a second holding mechanism (82) in rotation stop positions corresponding to end turn portions (1a, 1b) of the coil spring (1).

公开(公告)号：EP3421176A1

公开(公告)日：2019-01-02

申请号：EP17756611.4

申请日：2017-02-23

Applicant: NHK Spring Co., Ltd.

Inventor： OKADA, Hideki ,  YOKOTA, Daisuke ,  MORIYAMA, Senri ,  AKIYAMA, Satoshi ,  KOMAZAKI, Masaya ,  NAGAYASU, Go

IPC: B24C1/10 ,  B24C3/24 ,  B24C3/32 ,  B24C9/00

Abstract: A shot peening device (50) includes a turntable (79) which rotates about a revolution axis (X1), holding mechanism (81, 82) which moves with the turntable (79), pressure mechanism (93) which compresses a coil spring (1), rotation mechanism (100) which rotates the coil spring (1), projection mechanism (57) which projects shots to the compressed coil spring (1), load cell (96, 97) which detects a load applied to the coil spring (1), and controller (98). A signal output from the load cell (96, 97) is input to the controller (98), and the controller (98) detects a chronological change of the load applied to the coil spring (1) during the shot peening.