VERTICAL MOTION IMPELLER-TYPE SHOT PEENING DEVICE AND COIL SPRING
    3.
    发明公开
    VERTICAL MOTION IMPELLER-TYPE SHOT PEENING DEVICE AND COIL SPRING 审中-公开
    垂直运动叶轮式喷丸装置和卷簧

    公开(公告)号:EP3184242A1

    公开(公告)日:2017-06-28

    申请号:EP15834152.9

    申请日:2015-06-09

    CPC classification number: B24C1/10 B24C3/24 F16F1/02 F16F1/04

    Abstract: A vertical motion impeller-type shot peening device (50) performs a second shot peening to a coil spring (10) including first shot peening indentations (20). The vertical motion impeller-type shot peening device (50) includes a workpiece holding mechanism (52) including a lower end turn support (84, 85) and an upper end turn support (95, 96), a stress applying mechanism (90) which compresses the coil spring (10), a rotation mechanism (100) which allows the coil spring (10) to rotate around the vertical axis, and a projection mechanism (57) which includes a pair of vertically movable impeller units (55, 56). A first rough surface (21) including first shot peening indentations (20) is formed on a part of end turn portions (10a, 10b) of the coil spring (10). A second rough surface (31) including second shot peening indentations (30) is formed on the entire surface of wire (11) except for the first rough surface (21).

    Abstract translation: 垂直运动叶轮式喷丸装置(50)对包括第一喷丸硬化压痕(20)的螺旋弹簧(10)执行第二喷丸。 上下运动叶轮式喷丸装置(50)包括:包括下端匝支承件(84,85)和上端匝支承件(95,96)的工件保持机构(52);应力施加机构(90) 压缩螺旋弹簧10的旋转机构100,使螺旋弹簧10绕垂直轴旋转的旋转机构100和包括一对可垂直移动的叶轮单元55,56的投射机构57, )。 包括第一喷丸压痕(20)的第一粗糙表面(21)形成在螺旋弹簧(10)的一部分端部转弯部分(10a,10b)上。 包括第二喷丸硬化凹痕(30)的第二粗糙表面(31)形成在除第一粗糙表面(21)之外的金属丝(11)的整个表面上。

    METHOD FOR MANUFACTURING COIL SPRING
    5.
    发明公开
    METHOD FOR MANUFACTURING COIL SPRING 审中-公开
    VERFAHREN ZUR HERSTELLUNG EINER SPULENFEDER

    公开(公告)号:EP2444200A1

    公开(公告)日:2012-04-25

    申请号:EP10789284.6

    申请日:2010-03-18

    CPC classification number: B21F35/00 B21F99/00 B24C1/10

    Abstract: A spring wire (20) is subjected to a first shot peening process (S6) and a second shot peening process (S7). In the first shot peening process (S6), a first shot is projected on the spring wire (20) at a first projectile speed. High kinetic energy of the first shot produces compressive residual stress in a region ranging from the surface of the spring wire (20) to a deep position. In the second spring wire process (S7), a second shot is projected at a second projectile speed lower than the speed of the first shot. The kinetic energy of the second shot is lower than that of the first shot. The low kinetic energy of the second shot increases the compressive residual stress in a region near the surface of the spring wire (20).

    Abstract translation: 对弹簧丝(20)进行第一喷丸硬化处理(S6)和第二喷丸硬化处理(S7)。 在第一喷丸硬化处理(S6)中,以弹射线的第一弹丸速度投射弹簧丝(20)。 第一次射击的高动能在从弹簧丝(20)的表面到深位置的区域中产生压缩残余应力。 在第二弹簧丝加工(S7)中,以比第一弹丸的速度低的第二弹丸速度投射第二射击。 第二枪的动能低于第一枪的动能。 第二次射击的低动能增加了弹簧丝(20)表面附近区域的压缩残余应力。

    COMPRESSION COIL SPRING, AND COIL SPRING MANUFACTURING DEVICE AND MANUFACTURING METHOD
    8.
    发明公开

    公开(公告)号:EP2416031A1

    公开(公告)日:2012-02-08

    申请号:EP10758437.7

    申请日:2010-03-18

    CPC classification number: B21F3/04 B21F35/00 F16F1/04

    Abstract: Bending deformation exceeding a yield stress is applied by winding a material for a coil spring on a mandrel at a temperature at which spring-back occurs. Coiling is performed simultaneously with the application of the bending deformation, and the load is removed after the coiling. This spring includes an outside surface region (W3) having a compressive residual stress and a compressive stress reduction region (W4) in which the compressive residual stress is reduced from the outside surface region (W3) toward the center of the material. A stress change portion (P1) at which a change from the compressive residual stress to a tensile residual stress occurs exists between the outside surface region (W3) and the center of the material. The spring further includes a tensile stress peak portion (P2), tensile stress reduction region (W5), and inside surface region (W6). The inside surface region (W6) has the tensile or compressive residual stress having an absolute value smaller than that of the outside surface region (W3).

    Abstract translation: 通过在发生回弹的温度下将用于螺旋弹簧的材料卷绕在心轴上来施加超过屈服应力的弯曲变形。 在施加弯曲变形的同时进行卷取,并且在卷取之后除去负载。 该弹簧包括具有压缩残余应力的外表面区域(W3)和压缩残余应力从外表面区域(W3)朝向材料的中心减小的压缩应力减小区域(W4)。 在外表面区域(W3)和材料的中心之间存在从压缩残余应力向拉伸残余应力的变化的应力变化部(P1)。 弹簧还包括拉伸应力峰值部分(P2),拉伸应力减小区域(W5)和内表面区域(W6)。 内表面区域(W6)的拉伸或压缩残余应力的绝对值小于外表面区域(W3)的绝对值。

    COIL SPRING PROCESSING DEVICE
    10.
    发明公开

    公开(公告)号:EP3421177A1

    公开(公告)日:2019-01-02

    申请号:EP17756615.5

    申请日:2017-02-23

    Abstract: A coil spring processing device includes an end positioning device (30), shot peening device (50), and controller (98). The end positioning device (30) positions ends (1c, 1d) of a coil spring (1). The shot peening device (50) includes a turntable mechanism (52), pressure mechanism (93), rotation mechanism (100) which rotates the coil spring (1), and projection mechanism (57) which projects shots. Holding mechanisms (81, 82) each include a lower shifting prevention jig (85) and an upper shifting prevention jig (91). The controller (98) stops a first holding mechanism (81) and a second holding mechanism (82) in rotation stop positions corresponding to end turn portions (1a, 1b) of the coil spring (1).

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