REFLECTION-TYPE PROJECTION OPTICAL SYSTEM AND EXPOSURE EQUIPMENT PROVIDED WITH SUCH REFLECTION-TYPE PROJECTION OPTICAL SYSTEM
    1.
    发明公开
    REFLECTION-TYPE PROJECTION OPTICAL SYSTEM AND EXPOSURE EQUIPMENT PROVIDED WITH SUCH REFLECTION-TYPE PROJECTION OPTICAL SYSTEM 审中-公开
    反射型以及与反射型EQUIPPED曝光装置等光学投影系统光学投影系统

    公开(公告)号:EP1811327A4

    公开(公告)日:2008-07-30

    申请号:EP05800551

    申请日:2005-11-04

    CPC classification number: G03F7/70233 G02B13/18 G02B17/0657 G03F7/70275

    Abstract: A projection optical system has eight reflecting mirrors and is adapted to form a reduced image of a first surface on a second surface. The projection optical system has a first imaging catoptric system (G1) for forming an intermediate image of the first surface, and a second imaging catoptric system (G2) for forming an image of the intermediate image on the second surface. The first imaging catoptric system has a first reflecting mirror (M1 ), a second reflecting mirror (M2), a third reflecting mirror (M3), and a fourth reflecting mirror (M4) in an order of incidence of light from the first surface side. The second imaging catoptric system has a fifth reflecting mirror (M5), a sixth reflecting mirror (M6), a seventh reflecting mirror (M7), and an eighth reflecting mirror (M8) in an order of incidence of light from the first surface side. At least one reflecting surface among the eight reflecting mirrors is comprised of a spherical surface.

    PROJECTION OPTICAL SYSTEM, EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD
    2.
    发明公开
    PROJECTION OPTICAL SYSTEM, EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD 有权
    投影光学系统,曝光装置及元件制造工艺

    公开(公告)号:EP1860477A4

    公开(公告)日:2008-08-20

    申请号:EP06713513

    申请日:2006-02-10

    CPC classification number: G03F7/70233 G02B17/0657 G03F7/70275

    Abstract: A projection optical system has at least eight reflecting mirrors and is relatively compact in the radial direction. The projection optical system comprises, for example, eight reflecting mirrors (M1 to M8) and forms a reduced image of a first surface (4) on a second surface (7). The projection optical system comprises a first reflecting image forming optical system (G1) which forms a first intermediate image (IMI1) of the first surface based on light from the first surface, a second reflecting image forming optical system (G2) which forms a second intermediate image (M2) of the first surface based on light from the first intermediate image, and a third reflecting image forming optical system (G3) which forms a reduced image on the second surface based on light from the second intermediate image. The number of reflecting mirrors (M6 to M8) which the third reflecting image forming optical system comprises is greater than the number of reflecting mirrors (M1, M2) which the first reflecting image forming optical system comprises.

    CATADIOPTRIC SYSTEM AND EXPOSURE DEVICE HAVING THIS SYSTEM
    3.
    发明公开
    CATADIOPTRIC SYSTEM AND EXPOSURE DEVICE HAVING THIS SYSTEM 审中-公开
    折反射系统及曝光装置与本系统

    公开(公告)号:EP1336887A4

    公开(公告)日:2008-07-09

    申请号:EP01976807

    申请日:2001-10-23

    CPC classification number: G02B17/0892 G02B17/0844 G03F7/70225 G03F7/70275

    Abstract: A catadioptric system includes: a first image forming optical system that includes at least two reflecting mirrors and forms a first intermediate image of a first plane with light originating from the first plane; a second image forming optical system that includes at least two reflecting mirrors and forms a second intermediate image of the first plane with light having traveled via the first image forming optical system; and a refractive type of third image forming optical system that forms a final image of the first plane onto a second plane with light having traveled via the second image forming optical system, and optical members constituting the first image forming optical system, the second image forming optical system and the third image forming optical system are all disposed along a single linear optical axis.

    PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS WITH THE SAME
    4.
    发明公开
    PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS WITH THE SAME 有权
    光学投影系统和曝光装置

    公开(公告)号:EP1701194A4

    公开(公告)日:2008-07-16

    申请号:EP04807454

    申请日:2004-12-21

    CPC classification number: G03F7/70233 G02B17/0663 G03F7/70275

    Abstract: A projection optical system comprises eight reflectors and forms a reduced image of a first surface (4) onto a second surface (7). It comprises a first reflective imaging optical system (G1) for forming an intermediate image of the first surface and a second reflective imaging optical system (G2) for forming an image of the intermediate image onto the second surface. The first reflective imaging optical system includes a first reflector (M1), a second reflector (M2) equipped with an aperture stop (AS), a third reflector (M3), and a fourth reflector (M4) successively as light enters from the first surface side. The second reflective imaging optical system includes a fifth reflector (M5), a sixth reflector (M6), a seventh reflector (M7), and an eighth reflector (M8) successively as light enters from the first surface side. This realizes a reflective projection optical system which can favorably correct aberrations while having a favorable reflection characteristic with respect to X-rays and keeping the reflectors from becoming bulky.

    PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    6.
    发明公开
    PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    投影光学系统,曝光装置和方法的设备生产

    公开(公告)号:EP2000840A4

    公开(公告)日:2009-07-29

    申请号:EP07737991

    申请日:2007-03-08

    CPC classification number: G02B27/0043 G02B17/0657 G03F7/70233

    Abstract: A projection optical system, which has a relatively large image side numerical aperture of, for instance, 0.45 or larger, and can inspect the surface-shape error of a reflection surface with a prescribed accuracy. The projection optical system is provided with a first reflecting image-forming optical system (G1) for forming an intermediate image of a first surface based on light from a first surface (4), and a second reflecting image-forming optical system (G2) for forming a reduced image on a second surface (7) based on light from the intermediate image. The first reflecting image-forming optical system (G1) is provided with a first concave reflective mirror (M1), a second convex reflective mirror (M2), a third reflective mirror (M3) and a fourth concave reflective mirror (M4). The second reflecting image-forming optical system (G2) is provided with a fifth concave reflective mirror (M5), a sixth reflective mirror (M6), a seventh convex reflective mirror (M7) and an eighth concave reflective mirror (M8) . The conditions of 1

    PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD
    7.
    发明公开
    PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD 有权
    投影光学系统,曝光装置,以及曝光方法

    公开(公告)号:EP1768172A4

    公开(公告)日:2008-03-05

    申请号:EP05753442

    申请日:2005-06-22

    CPC classification number: G03F7/7025 G03F7/70233

    Abstract: A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.

    Catadioptric optical system
    8.
    发明公开
    Catadioptric optical system 无效
    一种反射折射光学系统

    公开(公告)号:EP0869383A2

    公开(公告)日:1998-10-07

    申请号:EP98105955

    申请日:1998-04-01

    CPC classification number: G02B17/0892 G02B17/08 G03F7/70225 G03F7/70275

    Abstract: In a catadioptric optical system, the first focusing lens system A includes a concave mirror Mc, and it forms an intermediate image of the first plane R. The second focusing lens system B includes an aperture stop AS, and it forms a refocused image of the intermediate image on the second plane W. A reflecting surface MP1 is placed so that the light flux leaving the first focusing lens system A is guided to the second focusing lens system B. There are one or more lens surfaces that satisfy the condition and one or more lens surfaces that satisfy the condition where h is the height at each lens surface of the light beam that is assumed to be emitted from the intersection of the optical axis of the first plane and passes through the lens surfaces with the maximum numerical aperture, and phi is the radius of the diaphragm of the aperture stop. At least one of the lens surfaces that satisfy condition (1) and at least one of the lens surfaces that satisfy condition (2) are aspheric. The first aspheric element is placed near the intermediate image, while the second aspheric element is placed near the concave mirror or the aperture stop. The concave mirror itself may be formed as a second aspheric element.

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