Abstract:
A wide-field-of-view (WFOV) optical system includes a negative optical-power primary mirror configured to receive and reflect light from an image scene; a low optical-power secondary mirror configured to receive and reflect light from the primary mirror; a negative optical-power tertiary mirror configured to receive and reflect light from the secondary mirror; and a positive optical-power quaternary mirror configured to receive and reflect light from the tertiary mirror. The primary, secondary, tertiary and quaternary mirrors are configured to maintain an effective focal length (EFL) at edges of the field of view (FOV) of the optical system to be at least equal to a center of the FOV of the optical system so that a spatial resolution of the optical system essentially remains constant across the FOV.
Abstract:
The invention relates to projection system for guiding light with wavelengths ≤ 193 nm, from an object plane to an image plane, comprising at least a first mirror, a second mirror, a third mirror, a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror centered around an optical axis (HA) and arranged along the optical axis, with the light traveling form the object plane to the first mirror, then from the first mirror to the second mirror, then from the second mirror to the third mirror, then from the third mirror to the fourth mirror, then form the fourth mirror to the fifth mirror and then form the fifth mirror to the the sixth mirror , characterized in that the third mirror, the fourth mirror and the sixth mirror are arranged along the optical axis geometrically between the first mirror and the second mirror.
Abstract:
A projection optical system has eight reflecting mirrors and is adapted to form a reduced image of a first surface on a second surface. The projection optical system has a first imaging catoptric system (G1) for forming an intermediate image of the first surface, and a second imaging catoptric system (G2) for forming an image of the intermediate image on the second surface. The first imaging catoptric system has a first reflecting mirror (M1 ), a second reflecting mirror (M2), a third reflecting mirror (M3), and a fourth reflecting mirror (M4) in an order of incidence of light from the first surface side. The second imaging catoptric system has a fifth reflecting mirror (M5), a sixth reflecting mirror (M6), a seventh reflecting mirror (M7), and an eighth reflecting mirror (M8) in an order of incidence of light from the first surface side. At least one reflecting surface among the eight reflecting mirrors is comprised of a spherical surface.
Abstract:
A projection optical system has eight reflecting mirrors and is adapted to form a reduced image of a first surface on a second surface. The projection optical system has a first imaging catoptric system (G1) for forming an intermediate image of the first surface, and a second imaging catoptric system (G2) for forming an image of the intermediate image on the second surface. The first imaging catoptric system has a first reflecting mirror (M1 ), a second reflecting mirror (M2), a third reflecting mirror (M3), and a fourth reflecting mirror (M4) in an order of incidence of light from the first surface side. The second imaging catoptric system has a fifth reflecting mirror (M5), a sixth reflecting mirror (M6), a seventh reflecting mirror (M7), and an eighth reflecting mirror (M8) in an order of incidence of light from the first surface side. At least one reflecting surface among the eight reflecting mirrors is comprised of a spherical surface.
Abstract:
There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface, and an aperture stop along an optical path between the first and second reflective surfaces.
Abstract:
A mirror projection system for use in a step-and-scan lithographic projection apparatus, in which a mask pattern (15) is repetitively scan-imaged on a number of areas of a substrate (20) by means of a beam (b) of EUV radiation having a cross section shaped as a segment of a ring, has six imaging mirrors (5-10). The design is such that no intermediate image is formed and the system has a negative magnification. When using this projection system in a scanning apparatus, the mask and the substrate move in opposite directions during scanning, which is advantageous from a mechanical point of view.
Abstract:
A cataoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.
Abstract:
Ein Projektionsobjektiv zur Abbildung eines in einer Objektebene angeordneten Musters in eine Bildebene mit Hilfe von elektromagnetischer Strahlung aus dem extremen Ultraviolettbereich (EUV) hat zwischen Objektebene und Bildebene mehrere mit Reflexbeschichtungen versehene, abbildende Spiegel, die eine optische Achse des Projektionsobjektiv definieren. Mindestens einer der Spiegel hat eine gradierte Reflexbeschichtung mit einem zu einer Beschichtungsachse rotationssymmetrischen Schichtdickenverlauf, wobei die Beschichtungsachse exzentrisch zur optischen Achse des Projektionsobjektiv angeordnet ist. Die Bereitstellung mindestens einer dezentrierten, gradierten Reflexbeschichtung ermöglicht die Konstruktion von Projektionsobjektiven, die bei hoher Gesamttransmission eine gute Gleichmäßigkeit der Feldausleuchtung erlauben.