A WIDE-FIELD-OF-VIEW OPTICAL SYSTEM AND A METHOD FOR IMAGING THE GROUND
    1.
    发明授权
    A WIDE-FIELD-OF-VIEW OPTICAL SYSTEM AND A METHOD FOR IMAGING THE GROUND 有权
    宽视场光学系统和用于成像地面的方法

    公开(公告)号:EP2381286B1

    公开(公告)日:2018-04-04

    申请号:EP11151597.9

    申请日:2011-01-20

    Inventor: Cook, Lacy G.

    CPC classification number: G02B17/0657

    Abstract: A wide-field-of-view (WFOV) optical system includes a negative optical-power primary mirror configured to receive and reflect light from an image scene; a low optical-power secondary mirror configured to receive and reflect light from the primary mirror; a negative optical-power tertiary mirror configured to receive and reflect light from the secondary mirror; and a positive optical-power quaternary mirror configured to receive and reflect light from the tertiary mirror. The primary, secondary, tertiary and quaternary mirrors are configured to maintain an effective focal length (EFL) at edges of the field of view (FOV) of the optical system to be at least equal to a center of the FOV of the optical system so that a spatial resolution of the optical system essentially remains constant across the FOV.

    A six-mirror EUV projection system
    2.
    发明公开
    A six-mirror EUV projection system 审中-公开
    EUV-Projektionssystem mit sechs Spiegeln

    公开(公告)号:EP2169465A1

    公开(公告)日:2010-03-31

    申请号:EP09013507.0

    申请日:2006-05-10

    CPC classification number: G02B17/0657 G03F7/70233

    Abstract: The invention relates to projection system for guiding light with wavelengths ≤ 193 nm, from an object plane to an image plane,
    comprising at least a first mirror, a second mirror, a third mirror, a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror centered around an optical axis (HA) and arranged along the optical axis, with the light traveling form the object plane to the first mirror, then from the first mirror to the second mirror, then from the second mirror to the third mirror, then from the third mirror to the fourth mirror, then form the fourth mirror to the fifth mirror and then form the fifth mirror to the the sixth mirror , characterized in that the third mirror, the fourth mirror and the sixth mirror are arranged along the optical axis geometrically between the first mirror and the second mirror.

    Abstract translation: 本发明涉及一种投影系统,用于引导从物体平面到像平面波长193nm的光,其包括至少第一反射镜,第二镜,第三镜,第四镜(M4),第五镜 (M5)和以光轴(HA)为中心并沿着光轴布置的第六镜,其中光从物平面移动到第一镜,然后从第一镜到第二镜,然后从第二镜 然后从第三镜到第四镜,然后形成第四镜到第五镜,然后形成第五镜到第六镜,其特征在于,第三镜,第四镜和第六镜 沿几何方向沿着光轴布置在第一反射镜和第二反射镜之间。

    REFLECTION-TYPE PROJECTION OPTICAL SYSTEM AND EXPOSURE EQUIPMENT PROVIDED WITH SUCH REFLECTION-TYPE PROJECTION OPTICAL SYSTEM
    3.
    发明公开
    REFLECTION-TYPE PROJECTION OPTICAL SYSTEM AND EXPOSURE EQUIPMENT PROVIDED WITH SUCH REFLECTION-TYPE PROJECTION OPTICAL SYSTEM 审中-公开
    反射型以及与反射型EQUIPPED曝光装置等光学投影系统光学投影系统

    公开(公告)号:EP1811327A4

    公开(公告)日:2008-07-30

    申请号:EP05800551

    申请日:2005-11-04

    CPC classification number: G03F7/70233 G02B13/18 G02B17/0657 G03F7/70275

    Abstract: A projection optical system has eight reflecting mirrors and is adapted to form a reduced image of a first surface on a second surface. The projection optical system has a first imaging catoptric system (G1) for forming an intermediate image of the first surface, and a second imaging catoptric system (G2) for forming an image of the intermediate image on the second surface. The first imaging catoptric system has a first reflecting mirror (M1 ), a second reflecting mirror (M2), a third reflecting mirror (M3), and a fourth reflecting mirror (M4) in an order of incidence of light from the first surface side. The second imaging catoptric system has a fifth reflecting mirror (M5), a sixth reflecting mirror (M6), a seventh reflecting mirror (M7), and an eighth reflecting mirror (M8) in an order of incidence of light from the first surface side. At least one reflecting surface among the eight reflecting mirrors is comprised of a spherical surface.

    REFLECTION-TYPE PROJECTION OPTICAL SYSTEM AND EXPOSURE EQUIPMENT PROVIDED WITH SUCH REFLECTION-TYPE PROJECTION OPTICAL SYSTEM
    4.
    发明公开
    REFLECTION-TYPE PROJECTION OPTICAL SYSTEM AND EXPOSURE EQUIPMENT PROVIDED WITH SUCH REFLECTION-TYPE PROJECTION OPTICAL SYSTEM 审中-公开
    反射型以及与反射型EQUIPPED曝光装置等光学投影系统光学投影系统

    公开(公告)号:EP1811327A1

    公开(公告)日:2007-07-25

    申请号:EP05800551.3

    申请日:2005-11-04

    CPC classification number: G03F7/70233 G02B13/18 G02B17/0657 G03F7/70275

    Abstract: A projection optical system has eight reflecting mirrors and is adapted to form a reduced image of a first surface on a second surface. The projection optical system has a first imaging catoptric system (G1) for forming an intermediate image of the first surface, and a second imaging catoptric system (G2) for forming an image of the intermediate image on the second surface. The first imaging catoptric system has a first reflecting mirror (M1 ), a second reflecting mirror (M2), a third reflecting mirror (M3), and a fourth reflecting mirror (M4) in an order of incidence of light from the first surface side. The second imaging catoptric system has a fifth reflecting mirror (M5), a sixth reflecting mirror (M6), a seventh reflecting mirror (M7), and an eighth reflecting mirror (M8) in an order of incidence of light from the first surface side. At least one reflecting surface among the eight reflecting mirrors is comprised of a spherical surface.

    Abstract translation: 一种投影光学系统,具有八个反射镜,是angepasst上形成的第二表面的第一表面的缩小图像。 的投影光学系统具有用于在所述第一表面的中间图像形成第一成像反射系统(G1),以及用于在第二表面上形成中间图像的图像的第二成像反射系统(G2)。 第一成像反射光学系统具有第一反射镜(M1),第二反射镜(M2),第三反射镜(M3),以及在光的入射的顺序从第一表面侧的第四反射镜(M4) , 第二成像反射系统具有第五反射镜(M5),在光的入射顺序的第六反射镜(M6),第七反射镜(M7),以及第八反射镜(M8)从所述第一面侧 , 八个反射镜中的至少一个反射面由球面的。

    Projection optical system, exposure apparatus and device fabricating method
    6.
    发明公开
    Projection optical system, exposure apparatus and device fabricating method 有权
    Optisches Projektionssystem,Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

    公开(公告)号:EP1513019A2

    公开(公告)日:2005-03-09

    申请号:EP04020761.5

    申请日:2004-09-01

    Inventor: Sasaki, Takahiro

    CPC classification number: G02B17/0657 G03F7/70233 G03F7/70275

    Abstract: There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface, and an aperture stop along an optical path between the first and second reflective surfaces.

    Abstract translation: 提供了一种用于将物体表面上的图案以减小的尺寸投影到图像表面上的投影光学系统。 投影光学系统包括六个反射表面,其以从物体表面反射光的顺序包括第一反射表面,第二凸反射表面,第三凸反射表面,第四反射表面,第五反射表面和第六反射表面 反射表面和沿着第一和第二反射表面之间的光路的孔径光阑。

    LITHOGRAPHIC APPARATUS COMPRISING A DEDICATED MIRROR PROJECTION SYSTEM
    7.
    发明授权
    LITHOGRAPHIC APPARATUS COMPRISING A DEDICATED MIRROR PROJECTION SYSTEM 有权
    与目的的合适的镜面投影系统的光刻设备

    公开(公告)号:EP1005664B1

    公开(公告)日:2004-11-17

    申请号:EP99914692.1

    申请日:1999-04-22

    CPC classification number: G03F7/70233 G02B17/0657 G03F7/70275 G03F7/70358

    Abstract: A mirror projection system for use in a step-and-scan lithographic projection apparatus, in which a mask pattern (15) is repetitively scan-imaged on a number of areas of a substrate (20) by means of a beam (b) of EUV radiation having a cross section shaped as a segment of a ring, has six imaging mirrors (5-10). The design is such that no intermediate image is formed and the system has a negative magnification. When using this projection system in a scanning apparatus, the mask and the substrate move in opposite directions during scanning, which is advantageous from a mechanical point of view.

    Catoptric projection system, exposure apparatus and device fabrication method using the same
    9.
    发明公开
    Catoptric projection system, exposure apparatus and device fabrication method using the same 有权
    Katoptrisches Projektionssystem,Belichtungsvorrichtung und Herstellungsprozess mit deren Verwendung

    公开(公告)号:EP1335228A1

    公开(公告)日:2003-08-13

    申请号:EP03250720.4

    申请日:2003-02-05

    CPC classification number: G03F7/70233 G02B17/0652 G02B17/0657 G03F7/70275

    Abstract: A cataoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.

    Abstract translation: 用于将物体表面上的图案投影到图像表面上并用作形成中间图像的成像系统的计算投影光学系统包括基本上用作同轴系统的第一,第二,第三和第四反射镜,以顺序地反射光 从物体侧到图像侧,并且被布置成使得从物体表面到第一反射镜的光可以与从第二反射镜到第三反射镜的光相交。

    Reflektives Projektionsobjektiv für EUV-Photolithographie
    10.
    发明公开
    Reflektives Projektionsobjektiv für EUV-Photolithographie 有权
    Reflectktives ProjektionsobjektivfürEUV-Photolithographie

    公开(公告)号:EP1282011A2

    公开(公告)日:2003-02-05

    申请号:EP02016693.0

    申请日:2002-07-26

    Abstract: Ein Projektionsobjektiv zur Abbildung eines in einer Objektebene angeordneten Musters in eine Bildebene mit Hilfe von elektromagnetischer Strahlung aus dem extremen Ultraviolettbereich (EUV) hat zwischen Objektebene und Bildebene mehrere mit Reflexbeschichtungen versehene, abbildende Spiegel, die eine optische Achse des Projektionsobjektiv definieren. Mindestens einer der Spiegel hat eine gradierte Reflexbeschichtung mit einem zu einer Beschichtungsachse rotationssymmetrischen Schichtdickenverlauf, wobei die Beschichtungsachse exzentrisch zur optischen Achse des Projektionsobjektiv angeordnet ist. Die Bereitstellung mindestens einer dezentrierten, gradierten Reflexbeschichtung ermöglicht die Konstruktion von Projektionsobjektiven, die bei hoher Gesamttransmission eine gute Gleichmäßigkeit der Feldausleuchtung erlauben.

    Abstract translation: 该设备使用极紫外线范围的电磁辐射。 在物体和图像平面之间提供的具有反射涂层的成像反射镜定义了投影物镜的光轴。 至少一个反射镜具有分散的渐变反射涂层,其厚度轮廓与偏心于光轴的涂覆轴线对称旋转。

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