Cathode- depositing electrodepostion coating composition
    4.
    发明公开
    Cathode- depositing electrodepostion coating composition 失效
    通过阴极电沉积涂料组合物。

    公开(公告)号:EP0159883A2

    公开(公告)日:1985-10-30

    申请号:EP85302592.2

    申请日:1985-04-12

    IPC分类号: C09D5/44

    CPC分类号: C09D5/4488

    摘要: A cathode-depositing electrodeposition coating composition having excellent low-temperature curability comprising as essential ingredients

    (A) 100 parts by weight of a reaction product of (11 a high molecular compound having a molecular weight of 500 to 5,000 and containing carbon-carbon double bonds with an iodine number of 50 to 500 and 3 to 12% by weight of oxirane oxygen, and (2) 30 to 300 millimoles, per 100 g of the high molecular compound (1), of a specified amine compound,
    (B) 10 to 200 parts by weight of a reaction product of a specified diglycidyl compound with 1.9 to 2.1 moles, per molecule of the diglycidyl compound, of an alpha, beta-unsaturated carboxylic acid or an unsaturated fatty acid having a molecular weight of 100 to 350 and containing at least 10% by weight of a carbon-carbon double bond, or a mixture of both,
    (C) 0.5 to 10 parts by weight of a reaction product of a high molecular compound having a molecular weight of 500 to 5,000 and containing a carbon-carbon double bond with an iodine number of 50 to 500 and 40 to 400 millimoles, per 100 g of the high molecular compound, of a specified alpha, beta-unsaturated dicarboxylic acid and
    (D) 0.005 to 1.0 part by weight, as. I, of a water-soluble salt of an organic acid with a metal selected from manganese, cobalt, and copper.

    Cathode- depositing electrodepostion coating composition
    6.
    发明公开
    Cathode- depositing electrodepostion coating composition 失效
    阴离子沉积电沉积涂料组合物

    公开(公告)号:EP0159883A3

    公开(公告)日:1987-05-13

    申请号:EP85302592

    申请日:1985-04-12

    IPC分类号: C09D05/44

    CPC分类号: C09D5/4488

    摘要: A cathode-depositing electrodeposition coating composition having excellent low-temperature curability comprising as essential ingredients
    (A) 100 parts by weight of a reaction product of (11 a high molecular compound having a molecular weight of 500 to 5,000 and containing carbon-carbon double bonds with an iodine number of 50 to 500 and 3 to 12% by weight of oxirane oxygen, and (2) 30 to 300 millimoles, per 100 g of the high molecular compound (1), of a specified amine compound, (B) 10 to 200 parts by weight of a reaction product of a specified diglycidyl compound with 1.9 to 2.1 moles, per molecule of the diglycidyl compound, of an alpha, beta-unsaturated carboxylic acid or an unsaturated fatty acid having a molecular weight of 100 to 350 and containing at least 10% by weight of a carbon-carbon double bond, or a mixture of both, (C) 0.5 to 10 parts by weight of a reaction product of a high molecular compound having a molecular weight of 500 to 5,000 and containing a carbon-carbon double bond with an iodine number of 50 to 500 and 40 to 400 millimoles, per 100 g of the high molecular compound, of a specified alpha, beta-unsaturated dicarboxylic acid and (D) 0.005 to 1.0 part by weight, as. I, of a water-soluble salt of an organic acid with a metal selected from manganese, cobalt, and copper.

    Cathode-depositing electrodeposition coating composition
    7.
    发明公开
    Cathode-depositing electrodeposition coating composition 失效
    通过Kathodenausfällung涂覆用于电沉积的组合物。

    公开(公告)号:EP0141601A1

    公开(公告)日:1985-05-15

    申请号:EP84307221.6

    申请日:1984-10-19

    IPC分类号: C09D5/44 C08G59/20

    摘要: A cathode-precipitating electrodeposition coating having excellent low-temperature curability, said composition consisting essentially of

    (A) 100 parts by weight of a high molecular compound having a molecular weight of 500 to 10,000 and containing carbon-carbon double bonds with an iodine value of 50 to 500 and 30 to 300 millimoles of amino groups per 100 g,
    (B) 10 to 200 parts by weight of a product of reaction of a diglycidyl compound represented by the general formula
    wherein R 1 , R 2 and R 3 represent a hydrogen atom or a methyl group and n represents an integerof from 0 to 20, with at least one organic acid component selected from the group consisting of (a) both an alpha,beta-unsaturated dicarboxylic acid and an alpha,beta-unsaturated monocarboxylic acid, (b) an unsaturated fatty acid containing at least 10% by weight of carbon-carbon conjugated double bonds and having a molecular weight of 100 to 350, and (c) an alpha,beta-unsaturated monocarboxylic acid, a 1,2-dicarboxylic acid anhydride, and a monoepoxy compound in this sequence, and
    (C) 0.005 to 1.0 part by weight as metal of a manganese salt of an organic acid or manganese dioxide.

    Substrate having light-shielding layer, method for forming same and liquid crystal display device
    9.
    发明公开
    Substrate having light-shielding layer, method for forming same and liquid crystal display device 失效
    基板具有遮光层,使得相同的,并且液晶显示器的方法。

    公开(公告)号:EP0627663A1

    公开(公告)日:1994-12-07

    申请号:EP94303859.6

    申请日:1994-05-27

    IPC分类号: G03C7/12 G02F1/1335

    CPC分类号: G02F1/133512 G03F7/0007

    摘要: A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1 × 10² ohm·cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.

    摘要翻译: 一种用于制备具有光屏蔽层的基板的方法包括形成形成在透明基片的透明导电层上的光敏涂层的电影,通过薄膜掩模曝光的光敏涂层参展透光性,删除和显影的涂布膜 暴露透明导电层和电沉积的露出透明导电层上的暗色调的涂层用于形成遮光层,并加热该遮光层。 具有遮光层的基材具有1×10的体积电阻率<2> ohm.cm或更高,并且可以使用一种用于在液晶显示装置中的TFT阵列基板反电极基片。