摘要:
The present invention provides a forming mold or electroforming mother die comprising a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution comprising a silane surfactant represented by the formula [1]
R n -Si-X 4-n [1]
(wherein, R represents an optionally substituted hydrocarbon group having 1 to 20 carbon atoms, an optionally substituted halogenated hydrocarbon group having 1 to 20 carbon atom, a hydrocarbon group having a linking group which has 1 to 20 carbon atoms, or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, and X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3), and a catalyst capable of interacting with the silane surfactant, the release layer having excellent releasing properties and abrasion resistance, and a production method thereof.
摘要翻译:本发明提供一种成型模具或电铸母模,其包括模具或母模,以及由模具表面或母模表面上的有机薄膜组成的剥离层,所述脱模层通过使模具或母模与有机溶剂接触而形成 包含由式[1]表示的硅烷表面活性剂的溶液ƒ€ƒ€ƒ€ƒ€ƒ€ƒR n -Si-X 4-n€ƒ€ƒ€ƒ€ƒ[1] (其中,R表示可以具有取代基的碳原子数1〜20的烃基,可以具有取代基的碳原子数1〜20的卤代烃基,碳原子数1〜20的连接基的烃基或卤代烃基 具有1〜20个碳原子的连接基团,X表示羟基,卤素原子,碳原子数1〜6的烷氧基或酰氧基,n表示1〜3的整数),以及 能够与硅烷表面活性剂相互作用的催化剂, 具有优异的脱模性和耐磨性的剥离层及其制造方法。
摘要:
An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.
摘要:
To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.
摘要:
The present invention provides a forming mold or electroforming mother die comprising a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution comprising a silane surfactant represented by the formula [1]
R n -Si-X 4-n [1]
(wherein, R represents an optionally substituted hydrocarbon group having 1 to 20 carbon atoms, an optionally substituted halogenated hydrocarbon group having 1 to 20 carbon atom, a hydrocarbon group having a linking group which has 1 to 20 carbon atoms, or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, and X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3), and a catalyst capable of interacting with the silane surfactant, the release layer having excellent releasing properties and abrasion resistance, and a production method thereof.
摘要:
An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.
摘要:
An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.
摘要:
To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.