专利检索 ap:("NIPPON ZEON CO., LTD." OR "FUJITSU LIMITED") AND inv:"Takahashi, Nobukazu c/o Gijutsukaihatsu Center of" 第 1 页

1.

发明公开
Method for purifying novolak resins useful as material for coating on a semiconductor substrate 失效
标题翻译：用于净化NOVOLAK树脂的方法，用作在半导体基板上涂覆的材料

公开(公告)号：EP0251187A3

公开(公告)日：1988-03-30

申请号：EP87109092

申请日：1987-06-24

申请人： NIPPON ZEON CO., LTD. , FUJITSU LIMITED

发明人： Sugimoto, Sadao c/o Gijutsukaihatsu Center of , Kusunoki, Teturiyo c/o Gijutsukaihatsu Center of , Yajima, Mikio c/o Gijutsukaihatsu Center of , Takahashi, Nobukazu c/o Gijutsukaihatsu Center of , Fujino, Katsuhiro , Yano, Hiroshi , Fujimura, Shuzo

IPC分类号： C08G08/12 , H01L21/31

CPC分类号： H01B3/36 , C08G8/00 , G03F7/0236

摘要： A method of purifying novolak resins useful as a material for coating on a semiconductor substrate, which comprises dissolving a novolak resin in a solvent having a solubility in water at 20°C of not more than l00, and extracting the resulting solution with an acidic aqueous solution thereby to reduce the metal content of the resin. If desired, the solution may be subjected to both the extraction step and a centrifugal separation step in a desired sequence instead of the extraction step alone.