公开(公告)号：EP0237875A3

公开(公告)日：1988-10-05

申请号：EP87103124

申请日：1987-03-05

申请人： HOECHST AKTIENGESELLSCHAFT

发明人： Schneller, Arnold, Dr. ,  Lambert, Gabriele

IPC分类号： C08G08/12 ,  C07C69/63 ,  B01J31/22

CPC分类号： C08G8/00 ,  G03F7/0236

公开(公告)号：EP0251187A3

公开(公告)日：1988-03-30

申请号：EP87109092

申请日：1987-06-24

申请人： NIPPON ZEON CO., LTD. ,  FUJITSU LIMITED

发明人： Sugimoto, Sadao c/o Gijutsukaihatsu Center of ,  Kusunoki, Teturiyo c/o Gijutsukaihatsu Center of ,  Yajima, Mikio c/o Gijutsukaihatsu Center of ,  Takahashi, Nobukazu c/o Gijutsukaihatsu Center of ,  Fujino, Katsuhiro ,  Yano, Hiroshi ,  Fujimura, Shuzo

IPC分类号： C08G08/12 ,  H01L21/31

CPC分类号： H01B3/36 ,  C08G8/00 ,  G03F7/0236

摘要： A method of purifying novolak resins useful as a material for coating on a semiconductor substrate, which comprises dissolving a novolak resin in a solvent having a solubility in water at 20°C of not more than l00, and extracting the resulting solution with an acidic aqueous solution thereby to reduce the metal content of the resin. If desired, the solution may be subjected to both the extraction step and a centrifugal separation step in a desired sequence instead of the extraction step alone.

公开(公告)号：EP0133600A3

公开(公告)日：1986-05-14

申请号：EP84305477

申请日：1984-08-10

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Kamio, Kunimasa ,  Takagishi, Hisao ,  Kanagawa, Shuichi

IPC分类号： C08G59/08 ,  C08L63/04 ,  C08G08/12 ,  H01L23/30 ,  C08L63/02

CPC分类号： H05K1/0326 ,  C08G8/04 ,  C08G59/08 ,  C08L63/04 ,  H01B3/40 ,  H01L23/293 ,  H01L2924/0002 ,  H01L2924/00

摘要： An epoxy resin composition comprising a polyglycidyl ether prepared by reacting a 3-methyl-6-alkylphenol in the presence or absence of a phenol other than the 3-methyl-6-alkylphenol with an aldehyde to obtain a novolak, and then reacting the novolak with an epihalohydrin, which composition is useful in electronic fields, for example, for encapsulating semiconductor products or for the production of printed circuit boards.

公开(公告)号：EP0032062A3

公开(公告)日：1981-12-23

申请号：EP80304746

申请日：1980-12-29

申请人： MITSUI PETROCHEMICAL INDUSTRIES, LTD.

发明人： Takeda, Nobuyuki ,  Iwata, Tadao

IPC分类号： C08G08/28 ,  C08G08/04 ,  C08G08/12

CPC分类号： C08L61/06 ,  C08G8/04 ,  C08G8/24 ,  C08L63/00 ,  C08L101/00 ,  C08L2666/14 ,  C08L61/04 ,  C08L2666/16

摘要： Conventional novolak phenolic resins generally possess molecular weights of 1200 or less and exhibit unsatisfactory heat resistance and mechanical properties for all intended uses. Attempts to produce higher-molecular-weight resins have failed. These difficulties have been overcome and a high-molecular-weight novolak substituted phenolic resin having a number average molecular weight of at least 1500 is prepared by reacting (A) (i) a phenol component mainly comprising a bifunctional phenol or (ii) a low-molecular-weight novolak substituted phenolic resin derived from this phenol and an aldehyde, with (B) a chain extender selected from (i) dimethylolated products of bifunctional or trifunctional phenols, (ii) a low-molecular-weight resol substituted phenolic resin derived from a phenol component mainly comprising a bifunctional phenol and an aldehyde, (iii), an aldehyde, (iv) a ketone, (v) a diol and (vi) a dihalide in the presence of an acid catalyst, with the proviso that if the reactant (A) is the phenol component (i), the chain extender (B), is the resol substituted phenolic resin (ii). These high-molecular-weight novolak resins can be used in setting resin compositions with setting resins such as epoxy resins.