专利检索 ap:("National Center for Scientific Research Demokritos" OR "Argitis, Panagiotis" OR "Misiakos, Konstantinos" OR "Kakabakos, Sotirios E." OR "Douvas, Antonios" OR "Diakoumakos, Constantinos D.") AND inv:"KAKABAKOS, Sotirios, E.Inst. of Radioisotopes" 第 1 页

1.

发明公开
PHOTORESISTS PROCESSABLE UNDER BIOCOMPATIBLE CONDITIONS FOR MULTI-BIOMOLECULE PATTERNING 有权
标题翻译：条件下加工的生物相容性光刻胶于产生生物分子格局

公开(公告)号：EP1395878A1

公开(公告)日：2004-03-10

申请号：EP02727805.0

申请日：2002-05-30

申请人： National Center for Scientific Research Demokritos , Argitis, Panagiotis , Misiakos, Konstantinos , Kakabakos, Sotirios E. , Douvas, Antonios , Diakoumakos, Constantinos D.

发明人： ARGITIS, Panagiotis , MISIAKOS, Konstantinos , KAKABAKOS, Sotirios, E.Inst. of Radioisotopes , DOUVAS, Antonios , DIAKOUMAKOS, Constantinos D.

IPC分类号： G03F7/039 , G03F7/40 , G01N33/552 , G01N33/545

CPC分类号： G03F7/0397 , G01N33/545 , G01N33/552 , G03F7/40 , Y10S430/106 , Y10S430/111

摘要： Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described. The processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins. The preferred resist materials are based on (meth)acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group.