摘要:
An object of the invention is to provide a method for the stable production of a high-purity Group II-VI compound semiconductor on an industrial scale, and also a hexagonal crystal of Group II-VI compound semiconductor in which a metal can be doped easily. Another object of the invention is to provide a method of producing a Group II-VI compound semiconductor phosphor. The objects are achieved by a method of producing a Group II-VI compound semiconductor comprising generating a pulsed electrical discharge plasma between metallic electrodes in sulfur to produce a Group II-VI compound semiconductor; a method of producing a Group II-VI compound semiconductor phosphor using a pulsed electrical discharge plasma; and a hexagonal crystal of Group II-VI compound semiconductor composed of a plurality of twin crystals.
摘要:
The object of the present invention is to provide a method of producing low valence titanium oxides in a steady supply manner acceptable in industrial production. The low valence titanium oxides are produced by electrical discharge between two electrodes in an aqueous medium, wherein at least one of the electrodes is a titanium-containing electrode.
摘要:
An object is to provide a novel anatase titanium oxide having especially high photocatalytic activity as a photocatalyst useful as a material for environmental clean-up, such as removal of toxic substances, deodorization and decomposition of malodorous substances, prevention of fouling and sterilization, and a method of producing such an anatase titanium oxide. There is provided a titanium oxide having a reflectance of 80% or lower with respect to light having a wavelength of 400 nm to 700 nm. There is also provided a method of producing an anatase titanium oxide, comprising creating pulsed plasma by an electric current of lower than 5 amperes between titanium electrodes in water to oxidize a titanium. Preferably, the titanium oxide has a percentage weight loss of 1.0% or lower when heated at a temperature within the range of 400°C to 800°C, and has the anatase structure or the anatase and rutile structures.
摘要:
There is provided a geomembrane consisting of a multilayer structure comprising a barrier layer (A), an adhesive layer (B) made of an acid-modified thermoplastic resin and a thermoplastic resin layer (C), wherein the thermoplastic resin layer (C) is laminated on at least one side of the barrier layer (A) via the adhesive layer (B), and the barrier layer (A) has an ethylene unit content of 18 mol% or more and 55 mol% or less and comprises a modified ethylene-vinyl alcohol copolymer comprising a modifying group having a primary hydroxyl group. The geomembrane exhibits excellent peer strength between the barrier layer and the adhesive layer, exhibits further improved peel strength after prolonged exposure to high temperature and high humidity conditions.
摘要:
A resin composition superior in stability and external appearance characteristics during/following melt molding; and an extrusion-molded article, an injection-molded article and a blow-molded article that are formed from the resin composition are provided. The resin composition contains an ethylene-vinyl alcohol copolymer as a principle component, and has a heterogeneous nucleation index (f) of less than 0.6 as determined by formula (1) based on a differential scanning calorimetry (DSC) curve obtained by DSC in which the resin composition is cooled at a rate of 150 °C/sec from a molten state at 210 °C. In the formula (1), Q total represents an area of a total region surrounded by the DSC curve and a base line, and Q hetero represents an area of a heterogeneous region that is a part of the total region, falling within a range from the temperature lower than the melting point by 38 °C to a temperature lower than the melting point by 75 °C. f = Q hetero / Q total
摘要:
Provided is a modified ethylene-vinyl alcohol copolymer, wherein the copolymer is represented by a following formula (I), contents (mol%) of a, b, and c based on the total monomer units satisfy following formulae (1) through (3), and a degree of saponification (DS) defined by a following formula (4) is not less than 90 mol%,
18 ≤ a ≤ 55 0.01 ≤ c ≤ 20 100 - a + c × 0.9 ≤ b ≤ 100 - a + c DS = Total Number of Moles of Hydrogen Atoms in X Y and Z / Total Number of Moles of X Y and Z × 100