-
公开(公告)号：EP2158520A1
公开(公告)日：2010-03-03
申请号：EP08753093.7
申请日：2008-05-15
申请人： Nikon Corporation
IPC分类号： G03F7/20
CPC分类号： G03F7/70783 , G03F7/707
摘要： Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a movable support surface. A proximal region of a first membrane is mounted to the support surface. A distal region of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface from which multiple pins extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.
-
公开(公告)号：EP1756663A1
公开(公告)日：2007-02-28
申请号：EP04814940.5
申请日：2004-12-20
申请人： NIKON CORPORATION
CPC分类号： G03F7/70258 , G03F7/70341 , G03F7/70833 , G03F7/709
摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.
-
3.发明公开CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY 有权REINIGUNGSVERFAHRENFÜROPTIK IN IMMERSIONSLITHOGRAPHIE
公开(公告)号：EP1614001A2
公开(公告)日：2006-01-11
申请号：EP04759103.7
申请日：2004-04-02
申请人： NIKON CORPORATION
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus (100) has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9-11) arranged to retain a workpiece (W), and an optical system including an illumination source and an optical element (4) opposite the workpiece (W) for having an image pattern of the reticle (R) projected by radiation from the illumination source. A gap is defined between the optical element (4) and the workpiece (W), and a fluid-supplying device (5) serves to supply an immersion liquid (7) into this gap such that the supplied immersion liquid (7) contacts both the optical element (4) and the workpiece (W) during an immersion lithography process. A cleaning device (30) is incorporated for removing absorbed liquid from the optical element (4) during a cleanup process. The cleaning device (30) may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.
摘要翻译： 浸没式光刻设备（100）具有布置成保持掩模版（R），布置成保持工件（W）的工作台（9-11）的掩模版台（RST）和包括照明源和 光学元件（4），其与工件（W）相对，用于具有通过来自照明源的辐射而突出的标线（R）的图像图案。 在光学元件（4）和工件（W）之间限定间隙，并且流体供应装置（5）用于将浸没液体（7）供应到该间隙中，使得所提供的浸液（7）接触两者 光学元件（4）和工件（W）。 一种清洁装置（30），用于在净化过程中从光学元件（4）中去除吸收的液体。 清洁装置（30）可以利用对被吸收的液体，热，真空条件，超声波振动或气蚀气泡具有亲和性的清洁液体，以除去吸收的液体。 可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。
-
4.发明授权ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 有权与传输地区的环境系统，其用于浸没式光刻设备
公开(公告)号：EP1611486B1
公开(公告)日：2016-03-16
申请号：EP04759085.6
申请日：2004-04-01
申请人： Nikon Corporation
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.
-
公开(公告)号：EP1756663B1
公开(公告)日：2015-12-16
申请号：EP04814940.5
申请日：2004-12-20
申请人： Nikon Corporation
CPC分类号： G03F7/70258 , G03F7/70341 , G03F7/70833 , G03F7/709
摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.
-
公开(公告)号：EP1614001B1
公开(公告)日：2009-11-25
申请号：EP04759103.7
申请日：2004-04-02
申请人： NIKON CORPORATION
发明人： HAZELTON, Andrew, J., c/o Nikon Corporation , KAWAI, Hidemi , WATSON, Douglas, C. , NOVAK, W., Thomas
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus (100) has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9-11) arranged to retain a workpiece (W), and an optical system including an illumination source and an optical element (4) opposite the workpiece (W) for having an image pattern of the reticle (R) projected by radiation from the illumination source. A gap is defined between the optical element (4) and the workpiece (W), and a fluid-supplying device (5) serves to supply an immersion liquid (7) into this gap such that the supplied immersion liquid (7) contacts both the optical element (4) and the workpiece (W) during an immersion lithography process. A cleaning device (30) is incorporated for removing absorbed liquid from the optical element (4) during a cleanup process. The cleaning device (30) may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.
-
7.发明公开ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 有权与传输地区的环境系统，其用于浸没式光刻设备
公开(公告)号：EP1611486A2
公开(公告)日：2006-01-04
申请号：EP04759085.6
申请日：2004-04-01
申请人： NIKON CORPORATION
IPC分类号： G03F1/00
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.013 秒)
