Method of manufacturing semiconductor device with a heterojunction
    1.
    发明公开
    Method of manufacturing semiconductor device with a heterojunction 审中-公开
    Herstellungsverfahrenfüreine Halbleitervorrichtung mit einemHeteroübergang

    公开(公告)号:EP1876638A2

    公开(公告)日:2008-01-09

    申请号:EP07013139.6

    申请日:2007-07-04

    摘要: A semiconductor substrate (1,2) made of a semiconductor material is prepared, and a hetero semiconductor region (3) is formed on the semiconductor substrate (1,2) to form a heterojunction in an interface between the hetero semiconductor region (3) and the semiconductor substrate (1,2). The hetero semiconductor region (3) is made of a semiconductor material having a bandgap different from that of the semiconductor material, and a part of the hetero semiconductor region (3) includes a film thickness control portion whose film thickness is thinner than that of the other part thereof. By oxidizing the hetero semiconductor region (3) with a thickness equal to the film thickness of the film thickness control portion, a gate insulating film (4) adjacent to the heterojunction is formed. A gate electrode (5) is formed on the gate insulating film (4). This makes it possible to manufacture a semiconductor device including the gate insulating film (4) with a lower ON resistance, and with a higher insulating characteristic and reliability.

    摘要翻译: 制备由半导体材料制成的半导体衬底(1,2),并且在半导体衬底(1,2)上形成异质半导体区域(3),以在异质半导体区域(3)之间的界面形成异质结, 和半导体衬底(1,2)。 异质半导体区域(3)由具有与半导体材料的带隙不同的带隙的半导体材料制成,并且异质半导体区域(3)的一部分包括膜厚度比膜厚度薄的膜厚控制部 其他部分。 通过以与膜厚控制部的膜厚相等的厚度氧化异质半导体区域(3),形成与异质结相邻的栅极绝缘膜(4)。 栅极电极(5)形成在栅极绝缘膜(4)上。 这使得可以制造包括具有较低导通电阻的栅极绝缘膜(4)并且具有更高绝缘特性和可靠性的半导体器件。

    Method of manufacturing semiconductor device with a heterojunction
    5.
    发明公开
    Method of manufacturing semiconductor device with a heterojunction 审中-公开
    具有异质结的半导体器件的制造方法

    公开(公告)号:EP1876638A3

    公开(公告)日:2008-10-22

    申请号:EP07013139.6

    申请日:2007-07-04

    摘要: A semiconductor substrate (1,2) made of a semiconductor material is prepared, and a hetero semiconductor region (3) is formed on the semiconductor substrate (1,2) to form a heterojunction in an interface between the hetero semiconductor region (3) and the semiconductor substrate (1,2). The hetero semiconductor region (3) is made of a semiconductor material having a bandgap different from that of the semiconductor material, and a part of the hetero semiconductor region (3) includes a film thickness control portion whose film thickness is thinner than that of the other part thereof. By oxidizing the hetero semiconductor region (3) with a thickness equal to the film thickness of the film thickness control portion, a gate insulating film (4) adjacent to the heterojunction is formed. A gate electrode (5) is formed on the gate insulating film (4). This makes it possible to manufacture a semiconductor device including the gate insulating film (4) with a lower ON resistance, and with a higher insulating characteristic and reliability.