公开(公告)号：EP1729551A1

公开(公告)日：2006-12-06

申请号：EP05721591.5

申请日：2005-03-22

申请人： Nissin Electric Co., Ltd.

发明人： ONODA, Masatoshi, c/o Nissin Electric Co., Ltd. ,  TAKAHASHI, Eiji, c/o Nissin Electric Co., Ltd.

IPC分类号： H05H1/46 ,  C23C16/509 ,  C23F4/00 ,  H01L21/205 ,  H01L21/3065

CPC分类号： C23C16/509 ,  C23C16/24 ,  H01J37/32082

摘要： A plasma generating device provided with a plasma generating chamber (10) and a high-frequency antenna (1) arranged in the chamber (10) for generating inductively coupled plasma by applying a high-frequency power to a gas in the chamber (10) from the antenna (1). The antenna (1) is a low-inductance antenna formed of a first portion (11) extending from the outside of the chamber (10) into the chamber (10), and a plurality of second portions (12) diverging from an inner end (11e) of the first portion (11) in an electrically parallel fashion, and having a termination (12e) directly connected to the inner wall of the grounded chamber (10). The surface of the antenna (1) is coated with an electrically insulating material. Frequency of the high-frequency power applied to the antenna may be in a range from 40 MHz to hundreds of megahertz. The plasma generating device can generate desired plasma by suppressing disadvantages such as abnormal discharge, matching failure and others, and can be constructed so that a desired processing such as film deposition can be performed.

摘要翻译： 一种等离子体发生装置，其具有等离子体发生室（10）和布置在腔室（10）中的高频天线（1），用于通过向室（10）中的气体施加高频电力来产生电感耦合等离子体， 从天线（1）。 天线（1）是由从腔室（10）的外部延伸到腔室（10）中的第一部分（11）形成的低电感天线，以及从内部（10）分开的多个第二部分 （11e）的第一部分（11e），并且具有直接连接到接地室（10）的内壁的终端（12e）。 天线（1）的表面涂覆有电绝缘材料。 施加到天线的高频功率的频率可以在40MHz到数百MHz的范围内。 等离子体发生装置可以通过抑制诸如异常放电，匹配故障等的缺点来产生期望的等离子体，并且可以构造成可以进行期望的处理，例如膜沉积。