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    Penam derivatives and processes for producing the same
    3.
    发明公开
    Penam derivatives and processes for producing the same 失效
    PENAM衍生物及其生产方法

    公开(公告)号：EP0503597A3

    公开(公告)日：1992-12-09

    申请号：EP92104192.7

    申请日：1992-03-11

    申请人： OTSUKA KAGAKU KABUSHIKI KAISHA

    发明人： Torii, Shigeru ,  Tanaka, Hideo ,  Taniguchi, Masatoshi ,  Sasaoka, Mitio ,  Shiroi, Takashi ,  Kameyama, Yutaka

    IPC分类号： C07D499/84 ,  C07D499/86 ,  A61K31/43

    CPC分类号： C07D499/00 ,  Y02P20/55

    摘要： A penam derivative of the general formula

    wherein R 1 means hydrogen, halogen, amino or protected amino; R 2 means hydrogen, halogen, lower alkoxy, lower acyl, lower alkyl, hydroxy- or protected hydroxy-substituted lower alkyl, hydroxy or protected hydroxy, or R 1 and R 2 may jointly represent oxo; R 3 means hydrogen or a carboxy-protecting group; R 4 means hydrogen; R 5 means a group of the formula -CH 2 Y where Y means halogen, -N 3 , - ON0 2 , -OR 6 , -OCOR 6 , -SCSOR 6 , -SCSN(R 6 ) 2 , -SR 6 , -S0 2 R 6 , - NHR 6 , -N(R 6 ) 2 or a substituted or unsubstituted nitrogen-containing heterocyclic group having a free valence on nitrogen; R 6 means a lower alkyl, aryl or heterocyclic group which is substituted or unsubstituted; or R 4 and R 5 may jointly represent =CH 2 ; n means 0, 1 or 2; provided, however, that where R 4 and R 5 jointly represent =CH 2 , n is not equal to 0.

    Penam derivatives and processes for producing the same
    5.
    发明公开
    Penam derivatives and processes for producing the same 失效
    Penamderivate和Verfahren zu deren Herstellung。

    公开(公告)号：EP0503597A2

    公开(公告)日：1992-09-16

    申请号：EP92104192.7

    申请日：1992-03-11

    申请人： OTSUKA KAGAKU KABUSHIKI KAISHA

    发明人： Torii, Shigeru ,  Tanaka, Hideo ,  Taniguchi, Masatoshi ,  Sasaoka, Mitio ,  Shiroi, Takashi ,  Kameyama, Yutaka

    IPC分类号： C07D499/84 ,  C07D499/86 ,  A61K31/43

    CPC分类号： C07D499/00 ,  Y02P20/55

    摘要： A penam derivative of the general formula

    wherein R 1 means hydrogen, halogen, amino or protected amino; R 2 means hydrogen, halogen, lower alkoxy, lower acyl, lower alkyl, hydroxy- or protected hydroxy-substituted lower alkyl, hydroxy or protected hydroxy, or R 1 and R 2 may jointly represent oxo; R 3 means hydrogen or a carboxy-protecting group; R 4 means hydrogen; R 5 means a group of the formula -CH 2 Y where Y means halogen, -N 3 , - ON0 2 , -OR 6 , -OCOR 6 , -SCSOR 6 , -SCSN(R 6 ) 2 , -SR 6 , -S0 2 R 6 , - NHR 6 , -N(R 6 ) 2 or a substituted or unsubstituted nitrogen-containing heterocyclic group having a free valence on nitrogen; R 6 means a lower alkyl, aryl or heterocyclic group which is substituted or unsubstituted; or R 4 and R 5 may jointly represent =CH 2 ; n means 0, 1 or 2; provided, however, that where R 4 and R 5 jointly represent =CH 2 , n is not equal to 0.

    摘要翻译： 通式的penam衍生物，其中R 1表示氢，卤素，氨基或被保护的氨基; R 2表示氢，卤素，低级烷氧基，低级酰基，低级烷基，羟基或保护的羟基取代的低级烷基，羟基或保护的羟基，或R 1和R 2可以共同表示氧代; R 3表示氢或羧基保护基; R 4表示氢; R 5表示式-CH 2 Y的基团，其中Y表示卤素，-N 3，-ONO 2，-OR 6，-OCOR 6，-SCSOR 6，-SCSN（R 6）2 ，-SR 6，-SO 2 R 6，-NHR 6，-N（R 6）2或取代或未取代的在氮上具有游离价的含氮杂环基; R 6表示取代或未取代的低级烷基，芳基或杂环基; 或R 4和R 5可以共同表示= CH 2; n表示0,1或2; 但是，当R 4和R 5共同表示= CH 2时，n不等于0。