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    METHOD FOR PRODUCING OXAZOLE COMPOUND
    1.
    发明公开
    METHOD FOR PRODUCING OXAZOLE COMPOUND 有权
    VERFAHREN ZUR HERSTELLUNG EINER OXAZOLVERBINDUNG

    公开(公告)号：EP2890686A1

    公开(公告)日：2015-07-08

    申请号：EP13779396.4

    申请日：2013-08-29

    申请人： Otsuka Pharmaceutical Co., Ltd.

    发明人： OKADA, Minoru ,  KABUKI, Takashi ,  FUJIEDA, Shigeo ,  KOSEKI, Nao

    IPC分类号： C07D263/32

    CPC分类号： C07D263/32

    摘要： An object of the present invention is to provide a novel method for producing an oxazole compound. The invention relates to a method for producing a compound represented by formula (1): wherein R
    1 is lower alkyl group or halogen substituted lower alkyl group, R
    2 is lower alkyl group, R
    5 is lower alkyl group, R
    11 is lower alkyl group, halogen substituted lower alkyl group or a group represented by formula: -CY
    2 COOR
    12 , wherein Y is a halogen atom, R
    12 is an alkali metal atom or lower alkyl group, Ar
    1 is phenyl group substituted with lower alkyl group, etc., or pyridyl group substituted with lower alkyl group, etc., X
    2 , X
    3 and X
    9 are the same or different and are halogen atoms, X
    4 is a leaving group, and M is an alkali metal atom.

    摘要翻译： 本发明的目的是提供一种制备恶唑化合物的新方法。 本发明涉及一种由式（1）表示的化合物的制备方法：其中R1是低级烷基或卤素取代的低级烷基，R2是低级烷基，R5是低级烷基，R11是低级烷基，卤素取代 低级烷基或由式-CY2COOR12表示的基团，其中Y是卤素原子，R12是碱金属原子或低级烷基，Ar1是被低级烷基取代的苯基等，或被低级烷基取代的吡啶基 烷基等，X 2，X 3和X 9相同或不同，为卤素原子，X 4为离去基团，M为碱金属原子。