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    CARBOSTYRYL DERIVATIVES
    6.
    发明授权
    CARBOSTYRYL DERIVATIVES 失效
    CARBOSTYRYLDERIVATE

    公开(公告)号：EP0651747B1

    公开(公告)日：1996-03-27

    申请号：EP94914603.9

    申请日：1994-05-11

    申请人： OTSUKA PHARMACEUTICAL CO., LTD.

    发明人： NISHI, Takao ,  UNO, Tetsuyuki ,  SHU, Yoshio ,  TAMURA, Katsumi ,  OKADA, Minoru

    IPC分类号： C07D401/00 ,  A61K31/33

    CPC分类号： C07D401/12

    摘要： Carbostyril derivatives represented by general formula (1) [wherein, R1 is a hydrogen atom, a fluorine atom or a methyl group; R is a group of formula (a) (R2 is a methyl group, a trifluoromethyl group or a nitro group), or a group of formula (b) (R3 is a fluorine atom and p is an integer of 2 or 3); and n^_ is an integer of 2 or 3], or salts thereof. Said carbostyril derivatives or salts are useful as an agent for inhibiting the adhesion of platelets.

    METHOD FOR PRODUCING OXAZOLE COMPOUND
    8.
    发明公开
    METHOD FOR PRODUCING OXAZOLE COMPOUND 有权
    VERFAHREN ZUR HERSTELLUNG EINER OXAZOLVERBINDUNG

    公开(公告)号：EP2890686A1

    公开(公告)日：2015-07-08

    申请号：EP13779396.4

    申请日：2013-08-29

    申请人： Otsuka Pharmaceutical Co., Ltd.

    发明人： OKADA, Minoru ,  KABUKI, Takashi ,  FUJIEDA, Shigeo ,  KOSEKI, Nao

    IPC分类号： C07D263/32

    CPC分类号： C07D263/32

    摘要： An object of the present invention is to provide a novel method for producing an oxazole compound. The invention relates to a method for producing a compound represented by formula (1): wherein R
    1 is lower alkyl group or halogen substituted lower alkyl group, R
    2 is lower alkyl group, R
    5 is lower alkyl group, R
    11 is lower alkyl group, halogen substituted lower alkyl group or a group represented by formula: -CY
    2 COOR
    12 , wherein Y is a halogen atom, R
    12 is an alkali metal atom or lower alkyl group, Ar
    1 is phenyl group substituted with lower alkyl group, etc., or pyridyl group substituted with lower alkyl group, etc., X
    2 , X
    3 and X
    9 are the same or different and are halogen atoms, X
    4 is a leaving group, and M is an alkali metal atom.

    摘要翻译： 本发明的目的是提供一种制备恶唑化合物的新方法。 本发明涉及一种由式（1）表示的化合物的制备方法：其中R1是低级烷基或卤素取代的低级烷基，R2是低级烷基，R5是低级烷基，R11是低级烷基，卤素取代 低级烷基或由式-CY2COOR12表示的基团，其中Y是卤素原子，R12是碱金属原子或低级烷基，Ar1是被低级烷基取代的苯基等，或被低级烷基取代的吡啶基 烷基等，X 2，X 3和X 9相同或不同，为卤素原子，X 4为离去基团，M为碱金属原子。