公开(公告)号：EP2555058A3

公开(公告)日：2015-01-07

申请号：EP12178613.1

申请日：2012-07-31

申请人： Xerox Corporation ,  Palo Alto Research Center Incorporated

发明人： Pattekar, Ashish ,  Stowe, Timothy D ,  Biegelsen, David K ,  Odell, Peter G.

IPC分类号： G03G15/10 ,  G03G15/22 ,  B41C1/10

CPC分类号： G03G15/228 ,  B41C1/1033 ,  B41M1/06 ,  B41P2227/70 ,  G03G15/10 ,  G03G2215/00801

摘要： Methods and structures are disclosed to minimize the presence of vapor clouding in the path between an energy (e.g., radiation) source (16) and the dampening fluid layer in a variable data lithography system. Also disclosed are conditions for optimizing vaporization of regions of the dampening fluid layer for a given laser source power. Conditions are also disclosed for minimizing recondensation of vaporized dampening fluid onto the patterned dampening fluid layer. Accordingly, a reduction in the power required for, and an increase in the reproducibility of, patterning of a dampening fluid layer over a reimageable surface (12) in a variable data lithography system are disclosed.

公开(公告)号：EP2554385A1

公开(公告)日：2013-02-06

申请号：EP12178612.3

申请日：2012-07-31

申请人： Xerox Corporation ,  Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Moore, Steven R

IPC分类号： B41J2/005

CPC分类号： B41J2/0057

摘要： A printhead subsystem is disclosed for selectively removing portions of a layer (32) of dampening fluid disposed over an arbitrarily reimageable surface (12) in a variable data lithographic system. The subsystem comprises a thermal printhead element (40) disposed proximate the arbitrarily reimageable surface (12), and driving circuitry (38) communicatively connected to the thermal printhead for selectively temporarily heating the thermal printhead to an elevated temperature. Portions of the dampening fluid layer (32) proximate the thermal printhead (40) are vaporized and driven off the arbitrarily reimageable surface by the thermal printhead when the thermal printhead is at the elevated temperature, to thereby form voids in the dampening fluid layer.

摘要翻译： 公开了一种打印头子系统，用于选择性地移除设置在可变数据光刻系统中任意可再成像的表面（12）上的阻尼流体的层（32）的部分。 该子系统包括靠近任意可再成像的表面（12）设置的热敏打印头元件（40），以及与热打印头通信地连接的驱动电路（38），用于选择性地将热打印头暂时加热到升高的温度。 靠近热打印头（40）的润湿流体层（32）的部分在热打印头处于升高的温度时被热打印头蒸发并从热打印头驱逐出任意可再成像的表面，从而在润湿液层中形成空隙。

公开(公告)号：EP2554385B1

公开(公告)日：2015-07-15

申请号：EP12178612.3

申请日：2012-07-31

申请人： Xerox Corporation ,  Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Moore, Steven R

IPC分类号： B41J2/005

CPC分类号： B41J2/0057

公开(公告)号：EP2554383A3

公开(公告)日：2013-10-30

申请号：EP12178609.9

申请日：2012-07-31

申请人： Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Pattekar, Ashish ,  Peeters, Eric ,  Biegelsen, David K ,  Swartz, Lars-Erik ,  Daniel, Jurgen H

IPC分类号： B41F7/30 ,  B41F7/32 ,  B41F7/34 ,  B41C1/10 ,  B41N3/08

CPC分类号： B41F7/24 ,  B41F7/30 ,  B41F7/32 ,  B41F7/34 ,  B41N3/08 ,  B41P2227/70

摘要： A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems (30) for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface (12). The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.

摘要翻译： 公开了一种系统和相应的方法，用于在可变数据光刻系统中将润版液施加到成像元件的可再成像表面，而不需要成形辊。 在一个实施例中，该系统包括用于将润湿液从液相转换成分散液相并且用于引导包含润湿液的分散液在分散流体相中流动到可再成像表面（12）的子系统（30）。 润版液直接在可再成像表面上回复到液相。 在另一个实施例中，可以将连续的润湿液带直接施加到可再成像表面。 该实施例包括具有用于将连续流体带中的润湿液直接递送到可再成像表面的端口的主体结构以及与主体结构相关联的机构，用于当可再成像表面处于可再成像表面时在可再成像表面上剥离夹带空气层 运动。

公开(公告)号：EP2554384A1

公开(公告)日：2013-02-06

申请号：EP12178611.5

申请日：2012-07-31

申请人： Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Biegelsen, David K ,  Swartz, Lars-Erik ,  Daniel, Jurgen H

IPC分类号： B41F7/30 ,  B41F7/32 ,  B41F7/34 ,  B41C1/10 ,  B41N3/08

CPC分类号： B41F7/30 ,  B41C1/1033 ,  B41F7/32 ,  B41F7/34 ,  B41P2227/70

摘要： A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems (30) for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface (12). The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.

摘要翻译： 一种系统和方法是对应于游离缺失施加润版液来在可变数据平版印刷系统中的成像部件的成像表面光盘未经形式辊。 在一个，实施例的系统包括子系统（30），用于将润湿液从液相到分散流体相，和用于引导分散的流体，其包含在分散的流体相的润湿液到成像表面（12）的流动。 润湿液恢复到液相直接在成像表面。 在另一个实施例的润湿液的连续带可以被直接施加到所述成像表面。 该实施例包括具有用于直接递送润湿液在连续的流体带向所述成像表面的端口的车身结构，和一个机构，与所述本体结构相关联，用于在所述成像表面夹带的空气层的剥离。当成像表面是在 运动。

公开(公告)号：EP2228228A1

公开(公告)日：2010-09-15

申请号：EP10156157.9

申请日：2010-03-11

申请人： Xerox Corporation ,  Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Kazmaier, Peter M ,  Drappel, Stephan V

IPC分类号： B41M1/18 ,  B41M3/00

CPC分类号： B41M1/18 ,  B41M3/008 ,  B41M5/0029

摘要： According to some embodiments, a method for printing an image on a substrate includes applying a clear liftoff material to a surface of the substrate to form a sacrificial pattern (100), the clear liftoff material being substantially optically clear, and applying a first marking material to the surface of the substrate to form a first static pattern (200), a portion of the first static pattern arranged directly above a portion of the sacrificial pattern. The method further includes removing the portion of the first static pattern (200) from the surface of the substrate, and removing the sacrificial pattern from the surface of the substrate.

摘要翻译： 根据一些实施例，用于在基板上印刷图像的方法包括将明显的剥离材料施加到基板的表面以形成牺牲图案（100），所述透明剥离材料基本上是透明的，并且施加第一标记材料 到所述基板的表面以形成第一静态图案（200），所述第一静态图案的一部分直接布置在所述牺牲图案的一部分上方。 该方法还包括从衬底的表面去除第一静态图案（200）的部分，以及从衬底的表面去除牺牲图案。

公开(公告)号：EP2554384B1

公开(公告)日：2016-07-27

申请号：EP12178611.5

申请日：2012-07-31

申请人： Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Biegelsen, David K ,  Swartz, Lars-Erik ,  Daniel, Jurgen H

IPC分类号： B41F7/30 ,  B41F7/32 ,  B41F7/34 ,  B41C1/10 ,  B41N3/08

CPC分类号： B41F7/30 ,  B41C1/1033 ,  B41F7/32 ,  B41F7/34 ,  B41P2227/70

公开(公告)号：EP2561992B1

公开(公告)日：2015-01-28

申请号：EP12180979.2

申请日：2012-08-20

申请人： Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Curry, Douglas N ,  Maeda, Patrick Y

IPC分类号： B41J2/465

CPC分类号： B41J2/465

公开(公告)号：EP2561992A3

公开(公告)日：2014-01-22

申请号：EP12180979.2

申请日：2012-08-20

申请人： Palo Alto Research Center Incorporated

发明人： Stowe, Timothy D ,  Curry, Douglas N ,  Maeda, Patrick Y

IPC分类号： B41J2/465

CPC分类号： B41J2/465

摘要： A single-pass imaging system (100) for a printing apparatus capable of 1200 dpi or greater that includes a homogenous light generator (110) for generating homogenous light (118A) from high energy IR lasers, a spatial light modulator (120) including light modulating elements (125) arranged in a two-dimensional array, and an anamorphic optical system (130). The light modulating elements (125) are disposed such that each modulating element receives an associated homogenous light portion, and is individually adjustable between an "on" modulated state and an "off" modulated state, whereby in the "on" modulated state each modulating element modulates its received homogenous light portion such that an associated modulated light portion is directed onto a corresponding region of the anamorphic optical system. In the second modulated state, the associated homogenous light portion is prevented (e.g., blocked) from passing to the anamorphic optical system. The anamorphic optical system then anamorphically concentrates the modulated light portions to form a scan line image.

摘要翻译： 一种用于能够达到1200dpi或更大的打印设备的单程成像系统（100），其包括用于从高能量IR激光器产生均匀光（118A）的均匀光发生器（110），包括光的空间光调制器（120） 以二维阵列布置的调制元件（125），以及变形光学系统（130）。 光调制元件（125）被布置成使得每个调制元件接收相关联的同质光部分，并且可以在“开启”调制状态和“关闭”调制状态之间单独调节，由此在“开启”调制状态下，每个调制 元件调制其接收的同质光部分，使得相关联的调制光部分被引导到变形光学系统的对应区域上。 在第二调制状态下，防止（例如阻挡）相关的同质光部分传递到变形光学系统。 然后，变形光学系统将调制光部分变形地集中以形成扫描线图像。

公开(公告)号：EP2555058A2

公开(公告)日：2013-02-06

申请号：EP12178613.1

申请日：2012-07-31

申请人： Xerox Corporation ,  Palo Alto Research Center Incorporated

发明人： Pattekar, Ashish ,  Stowe, Timothy D ,  Biegelsen, David K ,  Odell, Peter G.

IPC分类号： G03G15/10 ,  G03G15/22

CPC分类号： G03G15/228 ,  B41C1/1033 ,  B41M1/06 ,  B41P2227/70 ,  G03G15/10 ,  G03G2215/00801

摘要： Methods and structures are disclosed to minimize the presence of vapor clouding in the path between an energy (e.g., radiation) source (16) and the dampening fluid layer in a variable data lithography system. Also disclosed are conditions for optimizing vaporization of regions of the dampening fluid layer for a given laser source power. Conditions are also disclosed for minimizing recondensation of vaporized dampening fluid onto the patterned dampening fluid layer. Accordingly, a reduction in the power required for, and an increase in the reproducibility of, patterning of a dampening fluid layer over a reimageable surface (12) in a variable data lithography system are disclosed.

摘要翻译： 公开了方法和结构，以使可变数据光刻系统中的能量（例如，辐射）源（16）和阻尼流体层之间的路径中存在蒸汽混浊。 还公开了用于优化用于给定激光源功率的润版液层的区域的蒸发的条件。 还公开了使汽化的阻尼流体在图案化阻尼流体层上的再凝结最小化的条件。 因此，公开了在可变数据光刻系统中的可再成像表面（12）上的阻尼流体层的图案化所需的功率的减少和再现性的增加。