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公开(公告)号：EP1918778A3
公开(公告)日：2009-04-29
申请号：EP07119637.2
申请日：2007-10-30
发明人： Caporale, Stefan J. , Barclay, George G , Wang, Deyan , Jia, Li
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials having a water contact angle that can be changed by treatment with base and/or one or more materials that comprise fluorinated photoacid-labile groups and/or one or more materials that comprise acidic groups spaced from a polymer backbone. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
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2.发明公开Compositions and processes for immersion lithography 有权Zusammensetzungen und VerfahrenfürImmersionslithografie
公开(公告)号：EP1918778A2
公开(公告)日：2008-05-07
申请号：EP07119637.2
申请日：2007-10-30
发明人： Caporale, Stefan J , Barclay, George G , Wang, Deyan , Jia, Li
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials having a water contact angle that can be changed by treatment with base and/or one or more materials that comprise fluorinated photoacid-labile groups and/or one or more materials that comprise acidic groups spaced from a polymer backbone. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
摘要翻译： 提供了可用于浸没光刻的新的光致抗蚀剂组合物。 本发明优选的光致抗蚀剂组合物包含一种或多种具有水接触角的材料，其可以通过用碱和/或一种或多种包含氟化光致酸不稳定基团的材料和/或一种或多种包含酸性基团间隔的材料 从聚合物骨架。 本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸液中。
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公开(公告)号：EP1918778B1
公开(公告)日：2016-08-03
申请号：EP07119637.2
申请日：2007-10-30
发明人： Caporale, Stefan J. , Barclay, George G , Wang, Deyan , Jia, Li
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
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公开(公告)号：EP2420892A1
公开(公告)日：2012-02-22
申请号：EP11189827.6
申请日：2007-10-30
发明人： Caporale, Stefan J. , Barclay, George G , Wang, Deyan , Jia, Li
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials having a water contact angle that can be changed by treatment with base and/or one or more materials that comprise fluorinated photoacid-labile groups and/or one or more materials that comprise acidic groups spaced from a polymer backbone. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
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公开(公告)号：EP2420891A1
公开(公告)日：2012-02-22
申请号：EP11189819.3
申请日：2007-10-30
发明人： Caporale, Stefan J. , Barclay, George G , Wang, Deyan , Jia, Li
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials having a water contact angle that can be changed by treatment with base and/or one or more materials that comprise fluorinated photoacid-labile groups and/or one or more materials that comprise acidic groups spaced from a polymer backbone. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
摘要翻译： 提供了可用于浸没式光刻的新型光刻胶组合物。 本发明优选的光刻胶组合物包含一种或多种水接触角可通过用碱和/或一种或多种包含氟化光酸不稳定基团的材料处理而改变的材料和/或包含酸性基团的一种或多种材料 来自聚合物主链。 本发明的特别优选的光致抗蚀剂可以在浸没式光刻加工过程中表现出减少的抗蚀剂材料浸出到与光刻胶层接触的浸没流体中。
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