公开(公告)号：EP1567915A4

公开(公告)日：2009-05-06

申请号：EP03754229

申请日：2003-10-20

申请人： SAMSUNG ELECTRONICS CO LTD ,  NAT INST OF ADVANCED IND SCIEN

发明人： KIM JOO-HO ,  TOMINAGA JUNJI ,  KUWABARA MASASHI

IPC分类号： G03F7/11 ,  B41M5/26 ,  B41M5/36 ,  G03F7/004 ,  G03F7/38 ,  G11B7/26 ,  H01L21/027

CPC分类号： G11B7/261 ,  B41M5/26 ,  B41M5/368 ,  B41M5/46 ,  B41M5/465

摘要： Provided are pattern forming materials including a thermal sensitive material layer formed on a target substrate, a first light-to-heat converting layer formed between the thermal sensitive material layer and the target substrate, and a second light-to-heat converting layer formed on a surface of the thermal sensitive material layer opposite to the first light-to-heat converting layer, the thermal sensitive material layer being interposed between the first and second light-to-heat converting layers. A higher aspect ratio fine pattern can be formed in the thermal sensitive material layer made of photoresist using heat generated in the first and second light-to-heat converting layers formed on both surfaces of the thermal sensitive material layer.