公开(公告)号：EP3045973A4

公开(公告)日：2017-03-22

申请号：EP14844507

申请日：2014-07-24

申请人： SHIN-ETSU POLYMER CO LTD ,  SHIN-ETSU CHEMICAL CO LTD

发明人： SUZUKI TSUTOMU ,  OHORI SHINICHI ,  KOITABASHI RYUJI ,  NAKAGAWA HIDEO ,  TAKASAKA TAKURO ,  KINOSHITA TAKAHIRO ,  FUKUDA HIROSHI

IPC分类号： G03F1/66 ,  H01L21/673

CPC分类号： G03F1/66 ,  H01L21/67359 ,  H01L21/67393

摘要： The purpose of the present invention is to further reliably reduce the contamination of photomask blanks due to the adherence of the dust and particles generated during the storage, transportation, or operation of the container while suppressing the effect on a resist pattern, thereby improving the quality and yield of the photomask blanks. The present invention pertains to a container (1) for storing photomask blanks that stores, transports, or safeguards photomask blanks (2), wherein at least one of the components is constituted by a thermoplastic resin where the amount of caprolactam measured by the dynamic head space method when kept for 60 minutes at 40°C is 0.01 ppm or less n-decane conversion amount per resin weight, and the surface resistance value is no more than 1.0E + 13 ohms.

摘要翻译： 本发明的目的是为了进一步可靠地减少由于在容器的储存，运输或操作期间产生的灰尘和颗粒的粘附，同时抑制对抗蚀剂图案的影响，从而提高质量，从而可靠地减少光掩模坯料的污染 和光掩模坯料的产率。 本发明涉及一种用于储存，运输或保护光掩模坯料（2）的光掩模坯料的容器（1），其中至少一个部件由热塑性树脂构成，其中由动态头测量的己内酰胺的量 在40℃下保持60分钟时的空间法为每个树脂重量为0.01ppm以下的正癸烷转化量，表面电阻值不大于1.0E + 13欧姆。