公开(公告)号：EP0043893B1

公开(公告)日：1985-12-11

申请号：EP81102879.4

申请日：1981-04-15

Applicant: SHIPLEY COMPANY INC.

Inventor： Castner, Christian B.

IPC: C25D21/12 ,  G01N21/00

CPC classification number: C25D21/14 ,  G01N21/8507

公开(公告)号：EP0043893A1

公开(公告)日：1982-01-20

申请号：EP81102879.4

申请日：1981-04-15

Applicant: SHIPLEY COMPANY INC.

Inventor： Castner, Christian B.

IPC: C25D21/12 ,  G01N21/00

CPC classification number: C25D21/14 ,  G01N21/8507

Abstract: Apparatus for regulating the concentration of plating solution (20) components in a plating bath comprising a sensing device (22) suspended in the bath responsive to the concentration of one or more plating components of the plating solution and capable of generating a signal and a pump for supplying replenisher solution to the bath, maintaining the concentration of components of the plating solution substantially constant during use of the plating bath.