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    Controlled electroless plating
    7.
    发明公开
    Controlled electroless plating 失效
    受控无电电镀

    公开(公告)号：EP0525282A3

    公开(公告)日：1994-01-19

    申请号：EP92102667.0

    申请日：1992-02-18

    Applicant: SHIPLEY COMPANY INC.

    Inventor： Sricharoenchaikit, Prasit ,  Calabrese, Gary S. ,  Gulla, Michael

    IPC: C23C18/52 ,  C23C18/34 ,  C23C18/40

    CPC classification number: C23C18/52

    Abstract: A composition for electrolessly depositing thin metal coatings in selective patterns of fine dimension. The electroless plating solutions of the invention are characterized by a low metal content and preferably, freedom from alkali or alkaline earth metal ions.

    Abstract translation: 用于以精细尺寸的选择性图案化学沉积薄金属涂层的组合物。 本发明的无电镀溶液的特征在于金属含量低，优选不含碱金属或碱土金属离子。

    Photoimageable compositions
    8.
    发明公开
    Photoimageable compositions 失效
    Lichtempfindliche Bildaufzeichnungszusammensetzungen。

    公开(公告)号：EP0568827A2

    公开(公告)日：1993-11-10

    申请号：EP93105753.3

    申请日：1993-04-07

    Applicant: SHIPLEY COMPANY INC.

    Inventor： Pai, Daniel Y. ,  Rodriguez, Stephen S. ,  Sinta, Roger F.

    IPC: G03F7/16 ,  G03F7/004 ,  G03F7/039

    CPC classification number: G03F7/039 ,  G03F7/164 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S524/901

    Abstract: The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-cleavable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.

    Abstract translation: 本发明提供可光成像的组合物，方法和制品。 特别地，本发明提供了一种方法，其包括将可光成像组合物的涂层电泳施加到导电表面上，该组合物包含含有一个或多个光致酸不稳定基团的材料。 本发明的可光成像组合物优选包含光致酸产生剂，含有一种或多种酸可切割官能团的材料，以及载体树脂，其含有一种或多种官能团，或可被处理为至少部分电离 。

    Antihalation compositions
    9.
    发明公开
    Antihalation compositions 失效
    Antireflexionszusammensetzungen。

    公开(公告)号：EP0542008A1

    公开(公告)日：1993-05-19

    申请号：EP92118070.9

    申请日：1992-10-22

    Applicant: SHIPLEY COMPANY INC.

    Inventor： Thackeray, James W. ,  Orsula, George W.

    IPC: G03F7/11 ,  G03F7/40 ,  G03F7/09

    CPC classification number: G03F7/091 ,  G03F7/038 ,  G03F7/38

    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

    Abstract translation: 用于减少光致抗蚀剂外涂层的曝光辐射的反射的抗晕化组合物和方法。 本发明的防光组合物包括树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。

    Amphoteric compositions
    10.
    发明公开
    Amphoteric compositions 失效
    Amphotere Zusammensetzungen。

    公开(公告)号：EP0539714A1

    公开(公告)日：1993-05-05

    申请号：EP92116000.8

    申请日：1992-09-18

    Applicant: SHIPLEY COMPANY INC.

    Inventor： Hawkins, Robert E. ,  Pai, Daniel Y.

    IPC: G03F7/16 ,  G03F7/038 ,  G03F7/032 ,  C09D5/44

    CPC classification number: G03F7/164 ,  C09D5/44 ,  G03F7/032 ,  G03F7/038 ,  Y10S430/136

    Abstract: The invention provides radiation sensitive compositions that comprise an amphoteric polymer, the polymer comprising at least two distinct carrier groups so that the polymer is positively polarized or negatively polarized upon treatment with an acid or base, respectively, enabling the compositions to be electrodeposited either anaphoretically or cataphoretically. Employing this amphoteric polymer in a radiation sensitive composition also allows the use of either an acid or base solution to image and remove the deposited composition irrespective of whether the composition was applied cataphoretically or anaphoretically. The compositions of the invention are also suitably formulated as liquid coating compositions or used to form dry film resists.

    Abstract translation: 本发明提供了包含两性聚合物的辐射敏感组合物，所述聚合物包含至少两个不同的载体基团，使得分别在用酸或碱处理时聚合物被正极化或负极化，使组合物可以通过阴离子或电沉积 cataphoretically。 在辐射敏感组合物中使用这种两性聚合物还允许使用酸或碱溶液来成像和除去沉积的组合物，而不管组合物是用阴离子或阴离子涂覆的。 本发明的组合物也适当地配制成液体涂料组合物或用于形成干膜抗蚀剂。

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